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MOCVD Epitaxial Growth and Characterization of Polar, Semipolar and Nonpolar InN Thin Films
Research Letter | 更新时间：2024-03-04
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    • MOCVD Epitaxial Growth and Characterization of Polar, Semipolar and Nonpolar InN Thin Films

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    • Chinese Journal of Luminescence   Vol. 45, Issue 2, Pages: 204-210(2024)

    • DOI：10.37188/CJL.20230303    

      CLC： O482.31

    • Published：05 February 2024，

      Received：29 November 2023，

      Revised：17 December 2023，

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  • ZHAO Jianguo,YIN Rui,XU Ru,et al.MOCVD Epitaxial Growth and Characterization of Polar, Semipolar and Nonpolar InN Thin Films[J].Chinese Journal of Luminescence,2024,45(02):204-210. DOI： 10.37188/CJL.20230303.

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Related Author

CHANG Jianhua
LIU Bin
ZHAO Jianguo
HU Jun
QIN Rui-fei
JIN Chong-jun
WANG Peng-cheng
XU Hua-wei

Related Institution

School of Physics and Engineering,Sun Yat-sen University
State Key Laboratory of Luminescence and Application, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Graduate University of Chinese Academy of Sciences
State Key Laboratory of Luminescence and Application, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Graduate University of the Chinese Academy of Sciences
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