Plasma Surface Modification for High-resolution insitu Growth of Perovskite Light-emitting Diode
Cover Story|更新时间:2026-06-24
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Plasma Surface Modification for High-resolution insitu Growth of Perovskite Light-emitting Diode
增强出版
Chinese Journal of LuminescenceVol. 47, Issue 6, Pages: 901-908(2026)
作者机构:
1.福州大学 物理与信息工程学院, 福建 福州 350108
2.中国福建省光电信息科技创新实验室, 福建 福州 350108
作者简介:
基金信息:
National Key Research and Development Program of China(2022YFB3606500);National Natural Science Foundation of China(62575071;62305063);Provincial Natural Science Foundation of Fujian(2023J01257)
FAN Shiyi,ZHENG Yueting,CHEN Xuwen,et al.Plasma Surface Modification for High-resolution in situ Growth of Perovskite Light-emitting Diode[J].Chinese Journal of Luminescence,2026,47(06):901-908.
FAN Shiyi,ZHENG Yueting,CHEN Xuwen,et al.Plasma Surface Modification for High-resolution in situ Growth of Perovskite Light-emitting Diode[J].Chinese Journal of Luminescence,2026,47(06):901-908.DOI: 10.37188/CJL.20260028. CSTR: 32170.14.CJL.20260028.
Plasma Surface Modification for High-resolution insitu Growth of Perovskite Light-emitting Diode增强出版