Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification
Luminescence Industry and Technology Frontier|更新时间:2025-03-24
|
Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification
增强出版
“In the field of micro LEDs, researchers have developed a new type of photoresist that improves quantum dot dispersion by modifying acrylic resin with N-phenylmaleimide side chains, providing a solution for the full-color application of Micro LEDs.”
Chinese Journal of LuminescenceVol. 46, Issue 3, Pages: 536-544(2025)
作者机构:
1.华中科技大学 武汉光电国家研究中心, 湖北 武汉 430074
2.福州大学 物理与信息工程学院, 福建 福州 350108
3.中国福建光电信息科学与技术创新实验室(闽都创新实验室), 福建 福州 350108
作者简介:
基金信息:
the National Key R&(2021YFB3501800);D Program of China(62322505;62374069;62175032);Natural Science Foundation for Distinguished Young Scholars of Fujian Province(2024J010046);Open Project Program of Wuhan National Laboratory of Optoelectronics(2023WNLOKF011)
JIANG Borui,SONG Boxiang,CHEN Enguo,et al.Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification[J].Chinese Journal of Luminescence,2025,46(03):536-544.
JIANG Borui,SONG Boxiang,CHEN Enguo,et al.Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification[J].Chinese Journal of Luminescence,2025,46(03):536-544. DOI: 10.37188/CJL.20240317. CSTR: 32170. 14. CJL. 20240317.
Quantum Dot Photoresists for Pixelated Color Conversion Films Based on N-Phenylmaleimide Modification增强出版