纳米尺度HfO2薄膜不同厚度对光学性质的影响

张寅辉; 任玲玲; 高慧芳; 刘小萍

doi:10.3788/fgxb20183903.0375

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纳米尺度HfO₂薄膜不同厚度对光学性质的影响

器件制备及器件物理 | 更新时间：2020-08-12

- 纳米尺度HfO₂薄膜不同厚度对光学性质的影响
- Optical Properties Research of Nanoscale HfO₂ Thin Films with Different Thicknesses
- 发光学报 2018年39卷第3期页码：375-382
- 作者机构：
  
  1. 中国计量科学研究院纳米新材料计量研究所北京,100029
  2. 太原理工大学表面工程研究所,山西太原,030024
- 作者简介：
- 基金信息：
  
  国家重点研发计划"();国家质量基础的共性技术研究与应用"();重点专项（2016YFF0204301）资助()
- DOI：10.3788/fgxb20183903.0375
  中图分类号： TB39;O434.19
- 纸质出版日期：2018-3-5，
  
  网络出版日期：2017-11-15，
  
  收稿日期：2017-6-25，
  
  修回日期：2017-9-28，
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张寅辉, 任玲玲, 高慧芳等. 纳米尺度HfO2薄膜不同厚度对光学性质的影响[J]. 发光学报, 2018,39(3): 375-382

ZHANG Yin-hui, REN Ling-ling, GAO Hui-fang etc. Optical Properties Research of Nanoscale HfO2 Thin Films with Different Thicknesses[J]. Chinese Journal of Luminescence, 2018,39(3): 375-382
张寅辉, 任玲玲, 高慧芳等. 纳米尺度HfO2薄膜不同厚度对光学性质的影响[J]. 发光学报, 2018,39(3): 375-382 DOI： 10.3788/fgxb20183903.0375.

ZHANG Yin-hui, REN Ling-ling, GAO Hui-fang etc. Optical Properties Research of Nanoscale HfO2 Thin Films with Different Thicknesses[J]. Chinese Journal of Luminescence, 2018,39(3): 375-382 DOI： 10.3788/fgxb20183903.0375.

摘要

HfO

薄膜厚度达到纳米级别时，其光学性质会发生变化。光谱椭偏仪能够同时得到纳米尺度薄膜的厚度和光学常数，但是由于测量参数的关联性，光学常数的结果不准确可靠。本文采用溯源至SI单位的掠入射X射线反射技术对纳米尺度HfO

薄膜厚度进行准确测量，再以该量值为准确薄膜厚度参考值。利用光谱椭偏仪测量HfO

膜厚和光学常数时，参考膜厚量值，从而得到对应相关膜厚的薄膜准确光学参数。研究了以Al

作为薄膜缓冲层的名义值厚度分别为2，5，10 nm的超薄HfO

薄膜厚度对光学性质的影响。实验结果表明，随着HfO

薄膜厚度的增加，折射率也逐渐增大，在激光波长632.8 nm下其折射率分别为1.901，2.042，2.121，并且接近于体材料，而消光系数始终为0，表明纳米尺度HfO

薄膜在较宽的光谱范围内具有较好的增透作用，对光没有吸收。

Abstract

When the thickness of HfO

film reaches nanometer level

its optical properties will change. The spectral ellipsometer can obtain the thickness and optical constant of the film at the same time. However

due to the relevance of the measurement parameters

the results of optical constants are not accurate and reliable. In this paper

the thickness of HfO

film is accurately measured by the grazing incidence X-ray reflex technique which can be traced to SI units. Then

the thickness of the HfO

film and the optical constant were measured by the spectral ellipsometer to obtain the accurate optical parameters of the film corresponding to the thickness of the film. The influence of the thickness of ultra-thin HfO

films with the nominal thickness of 2

10 nm on the optical properties was studied

using Al

as the film buffer layer. The experimental results show that the refractive index increases with the increase of HfO

film thickness

but the refractive index is 1.901

2.042

2.121 at the laser wavelength

and is close to the bulk material

but the extinction coefficient is always zero. It is shown that the nanoscale HfO

thin films have a good effect on the broad spectrum and it does not absorb light.

关键词

纳米尺度HfO2薄膜掠入射X射线反射技术光谱椭偏厚度和光学表征

Keywords

nanoscale HfO2 thin filmsgrazing incidence X-ray reflectivityspectroscopic ellipsometrycharacterization of thickness and optical properties

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