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北京工业大学电子信息与控制工程学院 光电子技术省部共建教育部重点实验室 北京,100124
纸质出版日期:2012-10-10,
收稿日期:2012-7-5,
修回日期:2012-8-13,
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李影智, 邢艳辉, 韩军, 陈翔, 邓旭光, 徐晨. 外延在蓝宝石衬底上的非掺杂GaN研究[J]. 发光学报, 2012,(10): 1084-1088
LI Ying-zhi, XING Yan-hui, HAN Jun, CHEN Xiang, DENG Xu-guang, XU Chen. Investigation of Non-doped GaN Grown on Sapphire Substrate[J]. Chinese Journal of Luminescence, 2012,(10): 1084-1088
李影智, 邢艳辉, 韩军, 陈翔, 邓旭光, 徐晨. 外延在蓝宝石衬底上的非掺杂GaN研究[J]. 发光学报, 2012,(10): 1084-1088 DOI: 10.3788/fgxb20123310.1084.
LI Ying-zhi, XING Yan-hui, HAN Jun, CHEN Xiang, DENG Xu-guang, XU Chen. Investigation of Non-doped GaN Grown on Sapphire Substrate[J]. Chinese Journal of Luminescence, 2012,(10): 1084-1088 DOI: 10.3788/fgxb20123310.1084.
采用改变生长条件的方法制备GaN薄膜
在(0001)面蓝宝石衬底上利用金属有机物化学气相沉积技术制备了不同样品
并借助X射线双晶衍射仪(XRD)、PL谱测试仪和光学显微镜对材料进行了分析。XRD(0002)面和(10
1
2)面测试均表明TMGa流量为70cm
3
/min时样品位错密度最低。利用该TMGa流量进一步制备了改变生长温度的样品。XRD和PL谱测试结果表明
提高生长温度有利于提高GaN样品的晶体质量和光学性能。最后
利用光学显微镜对样品的表面形貌进行了分析。
GaN thin films were prepared by changing the growth condition.The epitaxial layers were grown by metal-organic vapor phase epitaxy on sapphire (0001) substrates
and were characterized by photoluminescence
optical microscope and X-ray double crystal diffraction.In the experiment
we used full width at half maximum of X-ray double crystal diffraction to detect the dislocation density
and found the samples dislocation density was lowest when TMGa flows at 70 cm
3
/min.Using the best value of TMGa flows
we grew the samples by changing the growth temperature.Photoluminescence spectra showed that higher growth temperature is conducive to improve the optical properties
reduce the Ga vacancies density in the GaN samples
and improve the quality of GaN crystal.Optical microscope test indicated that the increasing of the growth temperature will improve the surface morphology
it gives the same conclusion with photoluminescence spectra test.
金属有机物化学气相沉积(MOCVD)非掺杂氮化镓(GaN)X射线双晶衍射(DCXRD)光致荧光(PL)光谱
metal-organic chemical vapor deposition(MOCVD)non-doped GaNdouble-crstal X-ray diffractionphotoluminescence spectra
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Zhang L Q,Zhang C H,Gou J,et al. PL and XPS study of radiation damage created by various slow highly charged heavy ions on GaN epitaxial layers [J]. Nuclear Instruments and Methods in Physics Research B,2011,269(23):2835-2839.
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Xu S J,Li G,Chua S J.Observation of optically-active metastable defects in undoped GaN epilayers [J]. Appl.Phys.Lett., 1998,72(19):2540-2543.向您推荐《液晶与显示》 ——中文核心期刊 《液晶与显示》 是中国最早创办的液晶学科专业期刊,也是中国惟一的液晶学科和显示技术领域中综合性专业学术期刊。它由中国科学院长春光学精密机械与物理研究所、中国光学光电子行业协会液晶专业分会和中国物理学会液晶分会主办,科学出版社出版。《液晶与显示》 以研究报告、研究快报、综合评述和产品信息等栏目集中报道国内外液晶学科和显示技术领域中最新理论研究、科研成果和创新技术,及时反映国内外本学科领域及产业信息动态,是宣传、展示我国该学科领域和产业科技创新实力与硕果,进行国际交流的平台。本刊是英国《科学文摘》(INSPEC)、美国《化学文摘》(CA)、俄罗斯《文摘杂志》(AJ)、美国《剑桥科学文摘》(CSA)、"中国科技论文统计源期刊"等20余种国内外著名检索刊物和文献数据库来源期刊。《液晶与显示》 征集有关各类显示材料及制备方法、液晶显示、等离子体显示、阴极射线管显示、发光二极管显示、有机电致发光显示、场发射显示、微显示、真空荧光显示、电致变色显示及其他显示、各类显示器件物理和制作技术、各类显示新型模式和驱动技术、显示技术应用、显示材料和器件的测试方法与技术、成像技术和图像处理等研究论文。《液晶与显示》热忱欢迎广大作者、读者广为利用,踊跃投稿。《液晶与显示》 为双月刊,国内定价40元。国内邮发代号:12-203;国外发行代号:4868BM。地 址:长春市东南湖大路3888号 国内统一刊号:CN 22-1259/O4 《液晶与显示》 编辑部 国际标准刊号:ISSN 1007-2780 邮 编:130033 国际刊名代码(CODEN):YYXIFY 电 话:(0431)86176059 传 真:(0431)84695881 E-mail:yjxs@ciomp.ac.cn 网 址:www.yjyxs.com
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