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深圳大学材料学院 深圳市特种功能材料重点实验室, 广东 深圳 518060
收稿日期:2009-09-25,
修回日期:2010-01-24,
纸质出版日期:2010
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朱德亮, 陈吉星, 曹培江, 贾芳, 柳文军, 马晓翠, 吕有明. 利用脉冲激光沉积法制备高Mg掺杂的六方相MgZnO薄膜[J]. 发光学报, 2010,31(2): 223-226
ZHU De-liang, CHEN Ji-xing, CAO Pei-jiang, JIA Fang, LIU Wen-jun, MA Xiao-cui, LU You-ming. Heavily Mg-doped Hexagonal Phase Thin ZnO Films Prepared by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2010,31(2): 223-226
朱德亮, 陈吉星, 曹培江, 贾芳, 柳文军, 马晓翠, 吕有明. 利用脉冲激光沉积法制备高Mg掺杂的六方相MgZnO薄膜[J]. 发光学报, 2010,31(2): 223-226 DOI:
ZHU De-liang, CHEN Ji-xing, CAO Pei-jiang, JIA Fang, LIU Wen-jun, MA Xiao-cui, LU You-ming. Heavily Mg-doped Hexagonal Phase Thin ZnO Films Prepared by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2010,31(2): 223-226 DOI:
选用Mg
0.2
Zn
0.8
O陶瓷靶,利用脉冲激光沉积(PLD)法,在单晶Si(100)和石英衬底上生长了一系列MgZnO薄膜(MZO)。通过X射线衍射(XRD)、扫描电子显微镜(SEM)、X射线能谱(EDS)和紫外可见光透射光谱(UV-Vis)等实验手段,研究了在不同工作压强下生长的薄膜样品的晶体结构、微观形貌和光学性能的变化。结果表明:所有的薄膜样品都是单一的ZnO六方相,禁带宽度随生长压强的升高而增加,变化范围在3.83~4.05 eV之间,最短吸收边接近300 nm。
As an important candidate material for photoelectric devices such as ultraviolet detector
thin Mg
x
Zn
1-
x
O films (MZO) have been recently given extensive attention. Most studies have been focused on changing target compositions to prepare MZO with absorption edge in the solar-blind region (220~280 nm). However
the mix phases of hexagonal ZnO and cubic MgO appear when the Mg concentration increases to certain percentage. For different growing technologies and parameters
different limits of Mg concentration have been reported to keep MZO single hexagonal phase. Besides
the Mg content in the prepared thin films often deviates from the targets according to most studies. In this paper
a series of thin MZO films were prepared with different growing pressure on the Si(111) and quartz substrates by using Mg
0.2
Zn
0.8
O target and pulsed laser deposition (PLD) method in order to adjust the Mg content in the prepared MZO samples. The crystal structures
micro-morphologies and optical properties were characterized by X-ray diffraction (XRD)
scanning electron microscopy (SEM)
X-ray energy dispersion spectra (EDS) and ultraviolet-visible absorption spectra. The EDS results showed that the Mg concentrations in the prepared samples change from 44.5% to 48.5% with the growing pressure from 5.210
-4
Pa to 0.3 Pa
much higher than that in the target. But all the thin films still show single hexagonal phase according to the XRD results. We suggested that the increase of Mg content in the thin films is due to the stronger binding force of Mg-O compared to Zn-O in the oxygen-deficient growing environment. The band-gap of the thin films increases from 3.83 eV to 4.05 eV with the increasing Mg content
which can be estimated from the transmittance spectra. Among all the MZO samples
the 48.5% Mg sample has the shortest absorption edge which is close to 300 nm
quite near the solar-blind region. This work would be helpful for the preparation of solar-bind thin MZO films with single phase.
Mingsong W, Eui J K, Sunwook K. Optical and structural properties of sol-gel prepared MgZnO alloy thin films [J]. Thin Solid Films, 2008, 516(6):1124-1129.[2] Zhou Jun, Fang Qingqing, Wang Baoming, et al. Preparation and luminescence properties of Zn1-xMgxO thin films by sol-gel method [J]. Chin. J. Lumin. (发光学报), 2008, 29(6):1036-1040 (in Chinese).[3] Sanjeev K, Vinay G, Sreenivas K. Structural and optical properties of magnetron sputtered MgxZn1-xO thin films [J]. J. Phys.: Condens Matter, 2006, 18(6):3343-3354.[4] Dong X, Zhu H C, Zhang B L, et al. Regulate the content of magnesium in MgxZn1-xO films by vacuum anneal [J]. Vacuum, 2008, 82(5):535-538.[5] Wei Z P, Lu Y M, Shen D Z, et al. Effect of interface on luminescence properties in ZnO/MgZnO heterostructures [J]. J. Lumin., 2006, 119-120:551-555.[6] Su Shichen, Lu Youming, Zhang Zhenzhong, et al. Structural and optical properties of high quality MgxZn1-xO films grown by P-MBE [J]. Chin. J. Lumin. (发光学报), 2008, 29(2):309-312 (in Chinese).[7] Jin C M, Roger J. Structural and optical properties of hexagonal MgxZn1-xO thin films [J]. J. Electron. Mater., 2006, 35(5):869-876.[8] Zhuang L, Wong K H. Microstructure and optical properties of MgxZn1-xO thin films grown by means of pulsed laser deposition [J]. Thin Solid Films, 2008, 516(16):5607-5611.[9] Yang W, Vispute R D, Choopun S, et al. Ultraviolet photoconductive detector based on epitaxial Mg0.34Zn0.66O thin films [J]. Appl. Phys. Lett., 2001, 78(18):2787-2789.[10] Krishnaprasad P S, Ragitha E K, Jayaraj M K. Structural and optical properties of Zn1-xMgxO films grown by pulsed laser deposition [J]. SPIE, 2008, 7067:70670E-1-11. [11] Wei W, Jin C, Yan R J. Growth-temperature-controlled optical properties of textured MgxZn1-xO thin films [J]. J. Electron. Mater., 2009, 38(4):613-617.
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