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Plasma Surface Modification for High-Resolution In Situ Growth of Perovskite Light-Emitting Diode
更新时间：2026-02-27

    • Plasma Surface Modification for High-Resolution In Situ Growth of Perovskite Light-Emitting Diode

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    • “The research progress in the field of high-resolution displays was introduced, and relevant experts explored a high-resolution patterning strategy based on hot nanoimprint and hydrophilic hydrophobic template induced crystallization, providing a new solution to the problem of traditional patterning techniques being difficult to balance high resolution, high fidelity, and perovskite film quality.”
    • Chinese Journal of Luminescence   Pages: 1-8(2026)

    • DOI：10.37188/CJL.20260028    

      CLC：
    • CSTR：32170.14.CJL.20260028    

    • Online First：26 February 2026，

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  • FAN Shiyi,ZHENG Yueting,CHEN Xuwen,et al.Plasma Surface Modification for High-Resolution In Situ Growth of Perovskite Light-Emitting Diode[J].Chinese Journal of Luminescence, DOI：10.37188/CJL.20260028 CSTR： 32170.14.CJL.20260028.

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