FAN Xian-hong, CHEN Bo, NI Qi-liang, WANG Xiao-guang. Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm[J]. Chinese Journal of Luminescence, 2008,29(2): 405-408
FAN Xian-hong, CHEN Bo, NI Qi-liang, WANG Xiao-guang. Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm[J]. Chinese Journal of Luminescence, 2008,29(2): 405-408DOI:
Normal-Incidence Reflectivity of Mo/Si Multilayer at 13.9 nm
The results of the reflectivity measurement of a laser-produced plasma (LPP) source of extreme ultraviolet (EUV) for 13.9 nm are presented. The designed structure with 120 layers of molybdenum/silicon (Mo/Si) multilayer and a period thickness of 7.14 nm was produced by ion beam sputter deposition technique. Because of the absorption by the increase overall thickness
diffusion between layers and surface oxidation (contamination)
adjacent normal-incidence
the reflectivity of multilayer at 13.9 nm remains below the theoretical value of 73.2%. The surface roughness of multilayer measured by atom force microscope (AFM) is 0.401 nm.
关键词
Mo/Si多层膜反射率极紫外波段
Keywords
Mo/Si multilayerreflectanceextra-ultraviolet wave band
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