Epitaxial Growth of Hexagonal Boron Nitride and Device Application
Invited Review|更新时间:2025-10-30
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Epitaxial Growth of Hexagonal Boron Nitride and Device Application
增强出版
“Report: Hexagonal boron nitride, as a low dimensional material, exhibits excellent performance in fields such as optoelectronics. The expert system introduced its structure and performance, discussed the preparation methods and application progress, and provided direction for future development.”
Chinese Journal of LuminescenceVol. 46, Issue 10, Pages: 1798-1818(2025)
作者机构:
1.中国科学院半导体研究所 宽禁带半导体研发中心, 北京 100083
2.中国科学院大学 材料科学与光电技术学院, 北京 100049
作者简介:
基金信息:
National Key R&D Program of China(2022YFB3605003);National Natural Science Foundation of China(52192614;62175228)