双波段截止分色滤光片研究

曹晶辉; 苏宙平; 胡莹; 胡立发; 朱华新

doi:10.3788/fgxb20173812.1675

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双波段截止分色滤光片研究

发光学应用及交叉前沿 | 更新时间：2020-08-12

- 双波段截止分色滤光片研究
- Study of Dual-band Cut-off for Edge Filter
- 发光学报 2017年38卷第12期页码：1675-1680
- 作者机构：
  
  江南大学理学院江苏省轻工光电工程技术研究中心, 江苏无锡 214122
- 作者简介：
- 基金信息：
  
  上海市全固态激光器与应用技术重点实验室开放课题（2012ADL03）();国家自然科学基金（60908041）();江苏省研究生创新项目（SJLX16_0492）资助()
- DOI：10.3788/fgxb20173812.1675
  中图分类号： O484
- 纸质出版日期：2017-12-5，
  
  收稿日期：2017-6-4，
  
  修回日期：2017-7-22，
扫描看全文
曹晶辉, 苏宙平, 胡莹等. 双波段截止分色滤光片研究[J]. 发光学报, 2017,38(12): 1675-1680

CAO Jing-hui, SU Zhou-ping, HU Ying etc. Study of Dual-band Cut-off for Edge Filter[J]. Chinese Journal of Luminescence, 2017,38(12): 1675-1680
曹晶辉, 苏宙平, 胡莹等. 双波段截止分色滤光片研究[J]. 发光学报, 2017,38(12): 1675-1680 DOI： 10.3788/fgxb20173812.1675.

CAO Jing-hui, SU Zhou-ping, HU Ying etc. Study of Dual-band Cut-off for Edge Filter[J]. Chinese Journal of Luminescence, 2017,38(12): 1675-1680 DOI： 10.3788/fgxb20173812.1675.

摘要

为实现45入射情况下K9基底上双波段截止分色的特性（截止带波长0.5~0.68 m、0.73~0.79 m，通带波长0.83~0.87 m），采用F-P型的带通滤光片膜系结构为初始结构，与常规设计理念相比有效减少了膜层的数量，薄膜的高折材料采用TiO

，低折材料采用SiO

，以实现双波段截止的目的。膜层的设计层数为23层，总厚度为2.278 m，借助电子束蒸发物理气相沉积法实现了镀制，利用分光光度计对镀制样品的透过率进行评估。测试结果显示，截止区（0.5~0.68 m和0.73~0.79 m）平均截止深度分别达到了12.57%和20.39%，通带0.83~0.87 m波段内的平均透过率达到了91.35%，样品测试曲线与设计相比，"蓝移"将近10 nm。薄膜样品基本实现了设计目标，具有双波段截止、高通带透过率的特性。在环境测试中：薄膜表现出显著的稳定性，膜层间匹配度适宜。该双波段截止分色滤光片能够应用在一些极端的情况下。

Abstract

To realize the characters of a dual-band filter that selectively transmit light of wavelengths of 0.83-0.87 m but cut off the wavelengths of 0.5-0.68 m and 0.73-0.79 m on a 45 incident angle on K9 substrate

a type of F-P bandpass filter was chosen to be the initial structure which effectively reduce the number of the thin film compared with the routine design concept. The high index material of titanium oxide (TiO

) and the low index material of silicon oxide (SiO

) were used during the course. The thickness of 23 layers was 2.278 m. The electron beam physical vapor deposition (EBPVD) was used to fabricate the coatings. The transmittance of the sample was measured by using the spectrophotometer. The average cutoff depth is 12.57% and 20.39% corresponded to the band from 0.5 m to 0.68 m and the band from 0.73 m to 0.79 m respectively from the test result. The average transmittance is up to 91.35% for the pass band from 0.83 m to 0.87 m. It appears almost the same with the designing result that the figure of transmittance shifts to the short wavelength by 10 nm. Beyond this

the edge filter cuts off in dual-band and gets the high transmittance in pass band. In the environmental tests

the coatings match well with each other which is remarkably stable. So

the dual-band cut-off edge filter can be applied in extreme cases.

关键词

光学薄膜电子束蒸发物理气相沉积滤光片

Keywords

optical thin filmelectron beam physical vapor deposition(EBPVD)filter

references

PEKKUCUKSEN I, ALTUNBASAK Y. Edge strength filter based color filter array interpolation[J]. IEEE Trans. Image Proc., 2012, 21(1):393-397.

莫朝燕. 光通信系统调制滤光膜的研制[D]. 长春:长春理工大学, 2014. MO CH Y. Design and Fabrication of Optical Communication System Modulated Filter Film[D]. Changchun:Changchun University of Science and Technology, 2014. (in Chinese)

郭金家, 刘智深. 水下拉曼光谱探测低通滤光片水拉曼信号抑制[J]. 光谱学与光谱分析, 2011, 31(9):2428-2430. GUO J J, LIU Z S. Water Raman spectrum suppression with low-pass filter in underwater in-situ raman spectroscpy[J]. Spectrosc. Spect. Anal., 2011, 31(9):2428-2430. (in Chinese)

张东平, 齐红基, 方明, 等. 微缺陷对薄膜滤光片环境稳定性的影响[J]. 光子学报, 2005, 34(6):873-876. ZHANG D P, QI H J, FANG M, et al.. Influence of the microdefect on the environment stability of thin film filters[J]. Acta Photon. Sinica, 2005, 34(6):873-876. (in Chinese)

王成, 张贵彦, 肖孟超, 等. 应力变化对多层薄膜窄带滤光片透射光谱的影响[J]. 光学精密工程, 2004, 12(4):393-397. WANG C, ZHANG G Y, XIAO M C, et al.. Influences of stress changes on transmission characteristics of multilayer thin-film narrow bandpass filters[J]. Opt. Precision Eng., 2004, 12(4):393-397. (in Chinese)

叶自煜, 王多书, 张佰森, 等. 宽截止长波红外带通滤光片的研制[J]. 真空科学与技术学报, 2009, 29(z1):39-41. YE Z Y, WANG D S, ZHANG B S, et al.. Development of infrared pass-band filters with wide rejection band[J]. J. Vac. Sci. Technol., 2009, 29(z1):39-41. (in Chinese)

范正修. 光学薄膜及其进展[J]. 光学学报, 2011, 34(9):276-280. FAN Z X. Development and recent progress of optical thin films[J]. Acta Opt. Sinica, 2011, 34(9):276-280. (in Chinese)

高晓丹, 葛卫龙. 光纤到户单纤三向截止滤光片的研制[J]. 红外与激光工程, 2011, 40(8):1508-1511. GAO X D, GE W L. Manufacture of interference edge filter for FTTH triplexer[J]. Infrared Laser Eng., 2011, 40(8):1508-1511. (in Chinese)

杨芳. 光子嫩肤用滤光片的研究[D]. 武汉:华中科技大学, 2005. YANG F. Studies on The Filter for Photorejuvenation[D]. Wuhan:Huazhong University of Science and Technology, 2005. (in Chinese)

李香波, 高劲松, 王彤彤, 等. SiO2单层膜的反常色散研究[J]. 光子学报, 2009, 38(8):2006-2010. LI X B, GAO J S, WANG T T, et al.. Anomalous dispersion of SiO2 single-layer coating[J]. Acta Photon. Sinica, 2009, 38(8):2006-2010. (in Chinese)

朱铄金, 朱丽慧, 黄清伟, 等. 6.5~14m红外长波通滤光片正面膜系的研制[J]. 光学仪器, 2009, 31(3):80-83. ZHU S J, ZHU L H, HUANG Q W, et al.. Research of 6.5~14m infrared long-wavelength pass filter pro-film system[J]. Opt. Instrum., 2009, 31(3):80-83. (in Chinese)

杨洁. 905 nm带通滤光片制备工艺的研究[D]. 长春:长春理工大学, 2011. YANG J. Research of Preparation Craft About 905 nm Band Pass Filter[D]. Changchun:Changchun University of Science and Technology, 2011. (in Chinese)

张霖. 选择性高吸收太阳能薄膜研究[D]. 合肥:合肥工业大学, 2014. ZHANG L. Research on High Selective Solar Absorption Film[D]. Hefei:Hefei University of Technology, 2014. (in Chinese)

朱华新, 王彤彤, 高劲松, 等. 宽通带宽截止带通滤光片研究[J]. 人工晶体学报, 2014, 43(5):1296-1301. ZHU H X, WANG T T, GAO J S, et al.. Study on pass-band and wide rejection band of band-pass filters[J]. J. Synth. Cryst., 2014, 43(5):1296-1301. (in Chinese)

刘永强, 杨益民, 杨崇民, 等. 透0.45m~1.6m反8m~12m宽光谱分色滤光片的制备[J]. 应用光学, 2009, 30(4):666-668. LIU Y Q, YANG Y M, YANG C M, et al.. Spectrum filter for transmitting in 0.45m~1.6m and reflecting in 8m~12m[J]. J. Appl. Opt., 2009, 30(4):666-668. (in Chinese)

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