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广东省光电功能材料与器件重点实验室, 华南师范大学 光电材料与技术研究所, 广东 广州 510631
纸质出版日期:2017-7-5,
收稿日期:2017-3-7,
修回日期:2017-4-17,
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张晗, 裴磊磊, 宿世臣. 高质量立方相ZnMgO的制备与紫外受激发射特性研究[J]. 发光学报, 2017,38(7): 905-910
ZHANG Han, PEI Lei-lei, SU Shi-chen. Realization of UVB Lasing in High Quality Cubic ZnMgO Films[J]. Chinese Journal of Luminescence, 2017,38(7): 905-910
张晗, 裴磊磊, 宿世臣. 高质量立方相ZnMgO的制备与紫外受激发射特性研究[J]. 发光学报, 2017,38(7): 905-910 DOI: 10.3788/fgxb20173807.0905.
ZHANG Han, PEI Lei-lei, SU Shi-chen. Realization of UVB Lasing in High Quality Cubic ZnMgO Films[J]. Chinese Journal of Luminescence, 2017,38(7): 905-910 DOI: 10.3788/fgxb20173807.0905.
利用脉冲激光沉积(PLD)设备在蓝宝石衬底上制备了高质量Zn
1-
x
Mg
x
O单晶薄膜,并对其结构和光学特性进行了深入细致的研究。通过能量衍射谱(EDS)确认Zn
1-
x
Mg
x
O薄膜的Mg组分为45%。在Zn
0.55
Mg
0.45
O薄膜的X射线衍射谱(XRD)中观测到了明显的位于36.67的衍射峰,对应的是(111)晶向的立方相ZnMgO。从透射光谱中可以看出,Zn
0.55
Mg
0.45
O具有陡峭的吸收边,没有发生相分离,在透射电镜图谱中也得到了证实。该ZnMgO薄膜还表现出了优异的光学特性,在Zn
0.55
Mg
0.45
O材料体系中实现了峰位位于310 nm的紫外光泵浦受激发射,其激光发射的阈值仅为22 kW/cm
2
。
The optical and structural properties of high-quality epitaxial Zn
1-
x
Mg
x
O films deposited by pulsed-laser deposition (PLD) were studied.Zn
1-
x
Mg
x
O films with~45% Mg incorporation were measured by EDS (Energy dispersive spectroscopy).XRD (X-ray diffraction) measurement results show that Zn
0.55
Mg
0.45
O films have a cubic phase structure without phase separation and are epitaxial grown along the
c
-axis of Al
2
O
3
substrate.In the films
intense UVB optical pumped stimulated emission of this pure cubic-phase ZnMgO can be observed.The lasing threshold is about 22 kW/cm
2
.Lasing occurs at UVB wavelength of~310 nm under optical pumping.
氧化锌镁脉冲激光沉积阈值
ZnMgOPLDthreshold
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