利用干涉光刻技术制备LED表面微纳结构

程俊超; 刘宏伟; 耿照新; 郭凯; 于丹丹; 宁平凡; 李晓云; 张建新

doi:10.3788/fgxb20173804.0470

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利用干涉光刻技术制备LED表面微纳结构

器件制备及器件物理 | 更新时间：2020-08-12

- 利用干涉光刻技术制备LED表面微纳结构
- Micro-nano Structures of LED Fabricated by Laser Interference Lithography
- 发光学报 2017年38卷第4期页码：470-476
- 作者机构：
  
  1. 天津工业大学电子与信息工程学院天津,300387
  2. 天津市光电检测技术与系统重点实验室, 天津 300387
  3. 中国科学院半导体研究所, 北京 100083
- 作者简介：
- 基金信息：
  
  天津市自然科学基金（14JCQNJC01000）;国家自然科学基金（11404239，61575144，61504093）;集成光电子学国家重点联合实验室开放课题（IOSKL2014KF15）资助项目
- DOI：10.3788/fgxb20173804.0470
  中图分类号： TN383+.1
- 纸质出版日期：2017-4-5，
  
  收稿日期：2016-10-26，
  
  修回日期：2016-11-30，
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程俊超, 刘宏伟, 耿照新等. 利用干涉光刻技术制备LED表面微纳结构[J]. 发光学报, 2017,38(4): 470-476

CHENG Jun-chao, LIU Hong-wei, GENG Zhao-xin etc. Micro-nano Structures of LED Fabricated by Laser Interference Lithography[J]. Chinese Journal of Luminescence, 2017,38(4): 470-476
程俊超, 刘宏伟, 耿照新等. 利用干涉光刻技术制备LED表面微纳结构[J]. 发光学报, 2017,38(4): 470-476 DOI： 10.3788/fgxb20173804.0470.

CHENG Jun-chao, LIU Hong-wei, GENG Zhao-xin etc. Micro-nano Structures of LED Fabricated by Laser Interference Lithography[J]. Chinese Journal of Luminescence, 2017,38(4): 470-476 DOI： 10.3788/fgxb20173804.0470.

摘要

为了制备大面积周期性微纳米结构以提高LED的发光效率'建立了劳厄德（Lloyd）干涉光刻系统。简单分析了该干涉光刻系统的工作原理'并介绍了利用干涉曝光工艺制备一维光栅、二维点阵、孔阵列等纳米结构图形的具体实验过程。最后对纳米图形进行结构转移'制备出了金属纳米结构。实验结果表明：利用劳厄德干涉光刻系统'可以在20 mm；20 mm大小的ITO衬底上稳定制备出周期为450 nm的均匀光栅或二维点阵列图形结构'它们的占空比也是可以调节变化的。

Abstract

In order to realize the preparation of large-area periodic micro-nano structures to enhance the luminous efficiency of LEDs

Lloyd laser interference lithography (LIL) system was established. The working principle of LIL system was simply analyzed and the experimental process of preparing the one-dimensional gratings

two-dimensional lattice and hole arrays was introduced. Finally

the nano-structures were transferred into suitable functional substrates for further applications. The experimental results indicate that the uniform gratings or two-dimensional lattice arrays structures with the period of 450 nm

whose duty cycle can also be changed

are successfully fabricated on 20 mm20 mm ITO substrates by using the LIL system.

关键词

干涉光刻周期结构发光二极管光提取

Keywords

interference lithographyperiodic structurelight emitting diodelight extraction

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