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1. 天津工业大学 电子与信息工程学院 天津,300387
2. 天津市光电检测技术与系统重点实验室, 天津 300387
3. 中国科学院 半导体研究所, 北京 100083
纸质出版日期:2017-4-5,
收稿日期:2016-10-26,
修回日期:2016-11-30,
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程俊超, 刘宏伟, 耿照新等. 利用干涉光刻技术制备LED表面微纳结构[J]. 发光学报, 2017,38(4): 470-476
CHENG Jun-chao, LIU Hong-wei, GENG Zhao-xin etc. Micro-nano Structures of LED Fabricated by Laser Interference Lithography[J]. Chinese Journal of Luminescence, 2017,38(4): 470-476
程俊超, 刘宏伟, 耿照新等. 利用干涉光刻技术制备LED表面微纳结构[J]. 发光学报, 2017,38(4): 470-476 DOI: 10.3788/fgxb20173804.0470.
CHENG Jun-chao, LIU Hong-wei, GENG Zhao-xin etc. Micro-nano Structures of LED Fabricated by Laser Interference Lithography[J]. Chinese Journal of Luminescence, 2017,38(4): 470-476 DOI: 10.3788/fgxb20173804.0470.
为了制备大面积周期性微纳米结构以提高LED的发光效率'建立了劳厄德(Lloyd)干涉光刻系统。简单分析了该干涉光刻系统的工作原理'并介绍了利用干涉曝光工艺制备一维光栅、二维点阵、孔阵列等纳米结构图形的具体实验过程。最后对纳米图形进行结构转移'制备出了金属纳米结构。实验结果表明:利用劳厄德干涉光刻系统'可以在20 mm;20 mm大小的ITO衬底上稳定制备出周期为450 nm的均匀光栅或二维点阵列图形结构'它们的占空比也是可以调节变化的。
In order to realize the preparation of large-area periodic micro-nano structures to enhance the luminous efficiency of LEDs
Lloyd laser interference lithography (LIL) system was established. The working principle of LIL system was simply analyzed and the experimental process of preparing the one-dimensional gratings
two-dimensional lattice and hole arrays was introduced. Finally
the nano-structures were transferred into suitable functional substrates for further applications. The experimental results indicate that the uniform gratings or two-dimensional lattice arrays structures with the period of 450 nm
whose duty cycle can also be changed
are successfully fabricated on 20 mm20 mm ITO substrates by using the LIL system.
干涉光刻周期结构发光二极管光提取
interference lithographyperiodic structurelight emitting diodelight extraction
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