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1. 中国石油大学 北京,102249
2. 中国科学院 微电子研究所 北京,100029
纸质出版日期:2012-12-10,
收稿日期:2012-7-19,
修回日期:2012-10-8,
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邵长金, 何静, 刘邦武, 夏洋, 李超波. 黑硅材料的制备及其光学特性[J]. 发光学报, 2012,33(12): 1357-1361
SHAO Chang-jin, HE Jing, LIU Bang-wu, XIA Yang, LI Chao-bo. Preparation and Optical Characterization of Black Silicon Materials[J]. Chinese Journal of Luminescence, 2012,33(12): 1357-1361
邵长金, 何静, 刘邦武, 夏洋, 李超波. 黑硅材料的制备及其光学特性[J]. 发光学报, 2012,33(12): 1357-1361 DOI: 10.3788/fgxb20123312.1357.
SHAO Chang-jin, HE Jing, LIU Bang-wu, XIA Yang, LI Chao-bo. Preparation and Optical Characterization of Black Silicon Materials[J]. Chinese Journal of Luminescence, 2012,33(12): 1357-1361 DOI: 10.3788/fgxb20123312.1357.
采用金催化化学腐蚀和钝化两个过程成功制备了黑硅。利用原子力显微镜、分光光度计、红外光谱仪和光致发光光谱仪分别对黑硅的微观结构、反射率、表面状态和发光性能进行了研究。结果表明:黑硅表面呈现山峰状的微观结构
其平均反射率可低至3.31%。光致发光光谱上出现了3个发光峰
分别由量子限制效应、硅氧烯、杂质和缺陷引起。
The black silicon has been successfully produced by Au particle-assisted chemical etching. The microstructure
reflectance
surface morphology and photoluminescence properties of black silicon have been investigated by atomic force microscope
spectrophotometer
infrared spectrometer and photoluminescence spectrometer
respectively. The results show that the obtained black silicon exhibits a mountain-like structure with the average reflectance of 3.31%. The mechanism of black silicon produced by Au particle-assisted chemical etching is the combination of etching effect and passivation effect. The photoluminescence spectrum can be separated into three peaks which results from quantum confinement effect
siloxene
impurity and defect
respectively.
黑硅微观结构反射率红外光谱光致发光光谱
black siliconmicrostructurereflectivityinfrared spectroscopyphotoluminescence spectroscopy
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