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浙江大学 硅材料国家重点实验室,浙江 杭州,310027
收稿日期:2009-11-25,
修回日期:1900-01-02,
网络出版日期:2010-04-30,
纸质出版日期:2010-04-30
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林 兰, 叶志镇, 龚 丽, 等. 射频反应磁控溅射法退火生长Na-N共掺杂p-ZnO薄膜[J]. 发光学报, 2010,31(2):199-203.
LIN Lan, YE Zhi-zhen, GONG Li, et al. Fabrication of Na-N Codoped p-type ZnO Films by RF Reactive Magnetron Sputtering and Post-annealing[J]. Chinese journal of luminescence, 2010, 31(2): 199-203.
采用射频反应磁控溅射法退火生长得到了Na-N共掺杂p-ZnO薄膜。XRD测试结果表明
退火前后均得到
c
轴择优取向的ZnO薄膜。Hall测试结果表明:退火后薄膜的电学性能明显改善
得到了p-ZnO薄膜
退火温度为450 ℃时取得最佳电学性能:室温电阻率为139.2 Ω·cm
迁移率为0.2 cm
2
·V
-1
·s
-1
空穴浓度为2.5×10
17
cm
-3
。XPS分析表明:Na掺入ZnO中作为受主Na
Zn
而存在
N主要以N—H键的形式存在
其受主N
O
的作用不明显
但是否存在Na
Zn
-N
O
受主复合体
还需进一步的研究。
Na-N co-doped p-type ZnO ∶ (Na
N)] thin films were prepared on glass substrates by RF reactive magnetron sputtering and post-annealing techniques in the N
2
O ambient. X-ray diffraction (XRD) measurements showed that all films possessed a good crystallinity with
c
-axis preferential orientation. After annealing
the intensity of the (002) diffraction peak and the value of 2
θ
increase and the FWHM decreases. Hall measurements showed that the electrical properties of ZnO ∶ (Na
N) films were improved after annealing and the p-type behavior was realized. The film annealed at 450 ℃ showed the lowest resistivity of 139.2 Ω·cm with a Hall mobility of 0.2 cm
2
·V
-1
·s
-1
and a carrier concentration of 2.5×10
17
cm
-3
. XPS measurements showed that Na
Zn
acceptor in ZnO ∶ (Na
N) is responsible for the p-type conductivity of the ZnO ∶ (Na
N). In addition
Na-N complex may exist in the films
which acts as acceptor. Detailed investigation is now in progress.
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