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1. 天津城建大学理学院 应用物理系 天津,300084
2. 南开大学电子信息与光学工程学院 光电子薄膜与器件研究所 天津,300071
纸质出版日期:2015-2-3,
收稿日期:2014-11-25,
修回日期:2014-12-16,
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李光旻, 刘玮, 林舒平等. 预制层溅射气压对CIGS薄膜结构及器件的影响[J]. 发光学报, 2015,36(2): 192-199
LI Guang-min, LIU Wei, LIN Shu-ping etc. Influence of Sputtering Pressure on The Structure and Device Properties of CIGS Thin Films[J]. Chinese Journal of Luminescence, 2015,36(2): 192-199
李光旻, 刘玮, 林舒平等. 预制层溅射气压对CIGS薄膜结构及器件的影响[J]. 发光学报, 2015,36(2): 192-199 DOI: 10.3788/fgxb20153602.0192.
LI Guang-min, LIU Wei, LIN Shu-ping etc. Influence of Sputtering Pressure on The Structure and Device Properties of CIGS Thin Films[J]. Chinese Journal of Luminescence, 2015,36(2): 192-199 DOI: 10.3788/fgxb20153602.0192.
研究了金属预制层制备过程中溅射气压对Cu(In
1-
x
Ga
x
)Se
2
(CIGS)薄膜及电池器件性能的影响.通过调节溅射气压改变预制层的结晶状态及疏松度与粗糙度
在合适的预制层结构下
活性硒化热处理过程中
可使Ga有效地掺入到薄膜中形成优质的CIGS固溶体.高溅射气压会使预制层过于致密
呈现非晶态趋势.经活性硒化热处理后
CIGS薄膜容易产生CIS与CGS"两相分离"现象
从而导致CIGS薄膜太阳电池的开路电压和填充因子降低
电池转换效率由10.03%降低到5.02%.
The influence of sputtering pressure on the structure and device performances of Cu(In
1-
x
Ga
x
)Se
2
(CIGS) thin films is investigated. The crystalline and roughness of precursors can be moderated by choosing appropriate sputtering pressure
which may facilitate Ga incorporation into the lattice during the selenization process. With the sputtering pressure increases
the precursors tend to be amorphous state and become denser. As a result
the selenized films may display "phase separation" of CIS and CGS which results in decrease of
V
oc
and
FF
and the cell efficiency drops from 10.03% to 5.02%.
溅射气压粗糙度CIGS固溶体
sputtering pressureroughnessCIGS solid solution
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