Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence
Synthesis and Properties of Materials|更新时间:2026-09-12
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Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence
增强出版
Chinese Journal of LuminescenceVol. 45, Issue 12, Pages: 2011-2020(2024)
作者机构:
1.长春理工大学 高功率半导体激光国家重点实验室, 吉林 长春 130022
2.长春理工大学 重庆研究院, 重庆 401135
3.陆军装备部驻长春地区第一军事代表室, 吉林 长春 130000
作者简介:
基金信息:
Chongqing Natural Science Foundation Project(cstc2021jcyjmsxmX1060;CSTB2022NSCQ-MSX0401);The Developing Project of Science and Technology of Jilin Province(20210101473JC)
GAN Lulu,WANG Haizhu,ZHANG Chong,et al.Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence[J].Chinese Journal of Luminescence,2024,45(12):2011-2020.
GAN Lulu,WANG Haizhu,ZHANG Chong,et al.Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence[J].Chinese Journal of Luminescence,2024,45(12):2011-2020.DOI: 10.37188/CJL.20240243.
Influence of 2 nm GaAs Insertion Layer on 905 nm InGaAs Multi Quantum Well Luminescence增强出版