Effects of Growth Parameters on Stimulated Emission Characteristics of AlGaN-based Deep Ultraviolet Multiple Quantum Wells on 4H-SiC Substrates
Synthesis and Properties of Materials|更新时间:2024-09-25
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Effects of Growth Parameters on Stimulated Emission Characteristics of AlGaN-based Deep Ultraviolet Multiple Quantum Wells on 4H-SiC Substrates
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“In the field of deep ultraviolet lasers, researchers have achieved high internal quantum efficiency and low threshold laser emission by optimizing growth parameters, providing new ideas for the development of high-performance AlGaN based lasers.”
Chinese Journal of LuminescenceVol. 45, Issue 6, Pages: 894-904(2024)
作者机构:
1.中国科学院半导体研究所 宽禁带半导体研发中心, 北京 100083
2.中国科学院大学 材料科学与光电技术学院, 北京 100049
3.山西中科潞安紫外光电科技有限公司, 山西 长治 046000
作者简介:
基金信息:
National Key R&D Program of China(2022YFB3605104);National Natural Science Foundation of China(62274163;62022080;62135013;62234001;62250071);Beijing Nova Program(20230484466);Youth Innovation Promotion Association CAS(2022000028;2023123)
ZHANG Ruijie,GUO Yanan,WU Han,et al.Effects of Growth Parameters on Stimulated Emission Characteristics of AlGaN-based Deep Ultraviolet Multiple Quantum Wells on 4H-SiC Substrates[J].Chinese Journal of Luminescence,2024,45(06):894-904.
ZHANG Ruijie,GUO Yanan,WU Han,et al.Effects of Growth Parameters on Stimulated Emission Characteristics of AlGaN-based Deep Ultraviolet Multiple Quantum Wells on 4H-SiC Substrates[J].Chinese Journal of Luminescence,2024,45(06):894-904. DOI: 10.37188/CJL.20240080.
Effects of Growth Parameters on Stimulated Emission Characteristics of AlGaN-based Deep Ultraviolet Multiple Quantum Wells on 4H-SiC Substrates增强出版