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Characterization and Growth Mechanisms of Low Dimensional InP Materials
Synthesis and Properties of Materials | 更新时间:2024-07-10
    • Characterization and Growth Mechanisms of Low Dimensional InP Materials

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    • Researchers have made significant progress in the field of semiconductor materials, successfully producing a large quantity of high-quality InP nanowires and nanopillars. The nanowires, with diameters between 30 and 65 nm and a film thickness of approximately 35 μm, and nanopillars, with diameters ranging from 550 to 850 nm and a film thickness of about 12 μm, were created using chemical vapor deposition and in-situ growth methods. The study also explored the growth mechanisms of the nanomaterials, with nanowires following the vapor-liquid-solid and nanopillars the solid-liquid-solid mechanism, offering new opportunities for the controlled preparation and large-scale production of InP nanomaterials.
    • Chinese Journal of Luminescence   Vol. 45, Issue 5, Pages: 779-793(2024)
    • DOI:10.37188/CJL.20240026    

      CLC: O482.31
    • Published:25 May 2024

      Received:30 January 2024

      Revised:20 February 2024

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  • NIU Yanping,MA Shufang,DONG Haoyan,et al.Characterization and Growth Mechanisms of Low Dimensional InP Materials[J].Chinese Journal of Luminescence,2024,45(05):779-793. DOI: 10.37188/CJL.20240026.

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Ma Shufang
Dong Haoyan
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