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1.福州大学 物理与信息工程学院, 福建 福州 350108
2.中国福建省光电信息科技创新实验室, 福建 福州 350108
[ "黄兴云(2000-),男,江西上饶人,硕士研究生,2022年于赣南师范大学获得学士学位,主要从事量子点发光器件制备及性能提升的研究。" ]
[ "杨开宇(1984-),男,福建福州人,博士,副教授,2019年于福州大学获得博士学位,主要从事量子点、钙钛矿等发光材料与器件的相关研究。" ]
[ "李福山(1978-),男,福建莆田人,博士,研究员,2005年于北京大学获得博士学位,主要从事量子点光电材料与器件的相关研究。" ]
收稿:2025-01-09,
修回:2025-02-07,
纸质出版:2025-06-25
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黄兴云,谢潇婷,杨开宇等.基于纳米压印的高分辨率和高效率量子点发光二极管[J].发光学报,2025,46(06):1120-1128.
HUANG Xingyun,XIE Xiaoting,YANG Kaiyu,et al.High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint[J].Chinese Journal of Luminescence,2025,46(06):1120-1128.
黄兴云,谢潇婷,杨开宇等.基于纳米压印的高分辨率和高效率量子点发光二极管[J].发光学报,2025,46(06):1120-1128. DOI: 10.37188/CJL.20250009. CSTR: 32170.14.CJL.20250009.
HUANG Xingyun,XIE Xiaoting,YANG Kaiyu,et al.High-resolution and High-performance Quantum Dots Light-emitting Diode Based on Nanoimprint[J].Chinese Journal of Luminescence,2025,46(06):1120-1128. DOI: 10.37188/CJL.20250009. CSTR: 32170.14.CJL.20250009.
目前,通过各种量子点图案化技术制备的高分辨率量子点发光二极管(Quantum dot light-emitting diode,QLED)普遍面临低效率的问题,其主要原因是像素之间存在较大的漏电流。为了解决该问题,本文采用纳米压印技术制备了蜂窝状聚甲基丙烯酸甲酯(Poly(methyl methacrylate),PMMA)薄膜,并将其作为电荷阻挡层应用在QLED发光层中,成功获得了分辨率为8 467像素每英寸(Pixel per inch,PPI)的红色QLED器件。由于PMMA良好的绝缘特性,电荷阻挡层成功隔绝了电子传输
层和空穴传输层的直接接触,所制备器件的漏电流相较于无阻挡层图案化器件大幅降低,使其外量子效率(External quantum efficiency,EQE)得到较大提升,最大EQE达到了15.31%,最大亮度为100 274 cd/m
2
。
The current high-resolution quantum dot light-emitting doides(QLEDs) fabricated by various quantum dots patterning techniques suffer from low efficiency, mainly due to the passage of large leakage currents between pixels. To solve this issue, a honeycomb Poly(methyl methacrylate)(PMMA) film was fabricated by nanoimprint technique and applied as a charge barrier layer in the QLED light emitting layer. The resulting red QLEDs with a resolution of 8 467 pixel per inch(PPI) were successfully fabricated. Due to the good insulating properties of PMMA, the charge barrier layer successfully isolates the electron transport layer and the hole transport layer. Therefore, the leakage current of our device is greatly reduced compared to the device without charge barrier layer patterning, and the external quantum efficiency(EQE) is greatly improved, with a maximum EQE of 15.31% and a maximum brightness of 100 274 cd/m
2
.
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