浏览全部资源
扫码关注微信
陕西科技大学 理学院,陕西 西安,710021
纸质出版日期:2015-11-10,
收稿日期:2015-8-10,
修回日期:2015-9-14,
扫 描 看 全 文
丁磊, 张方辉,. 负电荷层对a-IGZO TFT阈值电压的影响[J]. 发光学报, 2015,36(11): 1320-1324
DING Lei, ZHANG Fang-hui,. Effects of Negative Charge Layer on The Threshold Voltage of a-IGZO TFT[J]. Chinese Journal of Luminescence, 2015,36(11): 1320-1324
丁磊, 张方辉,. 负电荷层对a-IGZO TFT阈值电压的影响[J]. 发光学报, 2015,36(11): 1320-1324 DOI: 10.3788/fgxb20153611.1320.
DING Lei, ZHANG Fang-hui,. Effects of Negative Charge Layer on The Threshold Voltage of a-IGZO TFT[J]. Chinese Journal of Luminescence, 2015,36(11): 1320-1324 DOI: 10.3788/fgxb20153611.1320.
采用脉冲直流磁控溅射的方式沉积In-Ga-Zn-O (IGZO)膜层作为TFT的有源层.在TFT沟道处的有源层和绝缘层的界面上
通过溅射法制作一定厚度的负电荷层对阈值电压(
V
th
)进行调制
使得
V
th
由-3.8 V升高至-0.3 V
器件由耗尽型向增强型转变.通过增加Al
2
O
3
作为负电荷层
可有效地将
V
th
控制在0 V附近
并且提高其器件稳定性
得到较好的电学特性:电流开关比
I
on
/
I
off
>
10
9
亚阈值摆幅
SS
为0.2 V/dec
阈值电压
V
th
为-0.3 V
迁移率
为9.2 cm
2
/(Vs).
TFT device with In-Ga-Zn-O (IGZO) film as the active layer deposited by pulse DC sputtering was fabricated. An Al
2
O
3
film which was also deposited by sputtering was sandwiched between the active layer and an insulating layer. The Al
2
O
3
acted as a negative charge layer for threshold voltage modulation (
V
th
). It raised the
V
th
from -3.8 V to -0.3 V
enhancing the formation of a depletion mode device. The application of Al
2
O
3
as a negative layer can effectively control
V
th
around 0 V and enhance the stability of the device. Improved device characteristics such as: on/off current ratio (
I
on
/
I
off
)
>
10
9
sub-threshold slope(
SS
) of 0.2 V/dec
V
th
of -0.3 V
and mobility (
) of 9.2 cm
2
/(Vs) were therefore achieved.
a-IGZO薄膜晶体管磁控溅射法负电荷层平带电势阈值电压
a-IGZO TFTMS sputteringnegative charge layerflat band potentialthreshold voltage
Kamiya T, Nomura K, Hosono H. Present status of amorphous In-Ga-Zn-O thin-film transistors [J]. Sci. Technol. Adv. Mater., 2010, 11(4):044305-1-6.
Park S J, Maen W J, Kim H S, et al. Review of recent developments in amorphous oxide semiconductor thin film transistor devices [J]. Thin Solid Films, 2012, 520(6):1679-1693.
Conley J F. Instabilities in amorphous oxide semiconductor thin-film transistors [J]. IEEE Trans. Dev. Mater. Reliab., 2010, 10:460-476.
Kikuchi Y, Nomura K, Yanayi H, et al. Device characteristics improvement of a-In-Ga-Zn-O TFTs by low-temperature annealing [J]. Thin Solid Films, 2010, 518(11):3017-3021.
Dao V A, Trinh T T, Jang K S, et al. Trapping time characteristics of carriers in a-InGaZnO thin-film transistors fabricate [J]. J. Electron. Mater., 2013, 42(4):711-715.
Kilic C, Zunger A. N-type doping of oxides by hydrogen [J]. Appl. Phys. Lett., 2002, 81(1):73-75.
Trinh T T, Van Nguyen D, Ryu K, et al. Improvement in the performance of an InGaZnO thin-film transistor by controlling interface trap densities between the insulator and active layer [J]. Semicond. Sci. Technol., 2011, 26(8):085012-1-6.
Park S, Bang S, Lee S, et al. The effect of annealing ambient on the characteristics of an indium-gallium-zinc oxide thin film transistor [J]. J. Nanosci. Nanotechnol., 2011, 11:6029-6033.
Tsujimura T. Vth compensation circuit for AMOLED displays composed of two TFTs and one capacity [J]. IEEE Xplore, 2007, 54(3):462-467.
Jankovic N D, Brajovic V. Vth compensated AMOLED pixel employing dual-gate TFT driver [J]. Electron. Lett., 2011, 47(7):456-457.
Dong H K, Ji U H, Mallory M, et al. Threshold voltage dependence on channel length in amorphous-indium-gallium-zinc-oxide thin-film transistors [J]. Appl. Phys. Lett., 2013, 102(8):083508-1-3.
Aoi T, Oka N, Sato Y, et al. DC sputter deposition of amorphous indium-gallium-zinc-oxide (a-IGZO) films with H2O introduction [J]. Thin Solid Films, 2010, 518(11):3004-3007.
Seo D, Shin S, Cho H, et al. Drastic improvement of oxide thermoelectric performance using thermaland plasma treatments of the InGaZnO thin films grown by sputtering [J]. Acta Materialia, 2011, 59:6743-6750.
Jung C H, Kim D J, Kang Y K, et al. Transparent amorphous In-Ga-Zn-O thin film as function of various gas flows for TFT applications [J]. Thin Solid Films, 2009, 517(14):4078-4081.
Chiu C J, Pei Z W, Chang S T, et al. Effect of oxygen partial pressure on electrical characteristics of amorphous indium gallium zinc oxide thin-film transistors fabricated by thermal annealing [J]. Vacuum, 2011, 86(3):246-249.
Chiang H Q, McFarlane B, Hong D, et al. Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors [J]. J. Non-Cryst. Solids, 2008, 354:2826-2830.
Liu S, Yu M, Lin C, et al. Influence of passivation layers on characteristics of a-InGaZnO thin-film transistors [J]. IEEE Electron Dev. Lett., 2011, 32:161-163.
Antonis O, Pedro B. Insight on the SU-8 resist as passivation layer for transparent Ga2O3In2O3 ZnO thin-filmtransistors [J]. J. Appl. Phys., 2010, 108(6):064505-1-6.
Zhang G, Wang J, Xiang G H. Effect of various sputtering gas on the characteristics of a-GZO TFT [J]. Chin. J. Electron Dev.(电子器件), 2012, 35(2):125-129 (in Chinese).
0
浏览量
58
下载量
1
CSCD
关联资源
相关文章
相关作者
相关机构