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1. 中国科学院 研究生院
2. 中国科学院 激发态物理重点实验室 长春光学精密机械与物理研究所
收稿:2011-03-29,
修回:2011-5-24,
网络首发:2011-09-22,
纸质出版:2011-09-22
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廖亚琴, 陈红, 刘星元. PrF<sub>3</sub>阳极缓冲层对OLED器件性能的影响[J]. 发光学报, 2011,32(9): 929-933
LIAO Ya-qin, CHEN-hong, LIU Xing-yuan. Effect of PrF<sub>3</sub> Anode Buffer Layer on The Performance of OLED[J]. Chinese Journal of Luminescence, 2011,32(9): 929-933
使用真空热蒸镀法制备的OLED器件
利用不同厚度的PrF
3
作阳极缓冲层
并和未加缓冲层的器件进行了对比。实验结果表明: 0.5 nm厚的PrF
3
阳极缓冲层可以有效增强OLED器件的空穴注入能力
增强电子和空穴的浓度平衡
优化器件的电致发光特性。 器件的最大电流效率为4.9 cd/A
最大亮度为33 600 cd/m
2
分别是未加入缓冲层的常规器件(3.7 cd/A
最大亮度为12 230 cd/m
2
)的1.3倍和2.75倍。
paper
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