
浏览全部资源
扫码关注微信
1. 上海大学 新型显示及应用集成教育部重点实验室
2. 上海大学 机电工程与自动化学院
收稿:2009-12-21,
修回:2010-6-7,
网络首发:2010-11-22,
纸质出版:2010-11-22
移动端阅览
王书方, 李喜峰, 张建华. 表面化学处理和退火对p-GaN/ZnO:Ga接触特性的影响[J]. 发光学报, 2010,31(6): 848-853
WANG Shu-fang, LI Xi-feng, ZHANG Jian-hua. Effects of Surface Chemical Treatment and Annealing on p-GaN/ZnO:Ga Contact[J]. Chinese Journal of Luminescence, 2010,31(6): 848-853
ZnO:Ga(GZO)透明电极沉积在p-GaN表面
用作透明电流扩展层。直接沉积在p-GaN上的p-GaN/GZO存在较大的势垒
容易形成肖特基接触
而良好的欧姆接触对功率LED器件至关重要。为了降低接触势垒
采用盐酸和氢氧化钠溶液对GaN表面进行去氧化层处理
并对p-GaN/GZO进行退火处理
研究表面处理和退火对p-GaN/GZO接触特性的影响。研究表明:碱性溶液处理有利于降低接触势垒;退火处理后
接触势垒略有增加。
paper
Bhosle V, Tiwari A, Narayan J. Electrical properties of transparent and conducting Ga doped ZnO [J]. J. Appl. Phys., 2006, 100 (3):033713-1-6.[2] Minami T. Present status of transparent conducting oxide thin-film development for indium-tin-oxide (ITO) substitutes [J]. Thin Solid Films, 2008, 516 (17):5822-5828.[3] Minami T. Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications [J]. Thin Solid Films, 2008, 516 (7):1314-1321.[4] Kim D H, Jeon H, Kim G, et al. Comparison of the optical properties of undoped and Ga-doped ZnO thin films deposited using RF magnetron sputtering at room temperature [J]. Opt. Commun., 2008, 281 (8):2120-2125.[5] Suvorova N A, Usov O, Stan L, et al. Structural and optical properties of ZnO thin films by rf magnetron sputtering with rapid thermal annealing [J]. Appl. Phys. Lett., 2008, 92 (14):141911-1-3.[6] Cheng Songhua, Ceng Xiangbin. Study on ZnO-based thin film transisters [J]. Chin. Journal of Liquid Crystals and Displays (液晶与显示), 2006, 21 (5):515-520 (in Chinese).[7] Tun C J, Sheu J K, Pong B J, et al. Enhanced light output of GaN-based power LEDs with transparent Al-doped ZnO current spreading layer [J]. IEEE Photonics Technology Lett., 2006, 18 (1-4):274-276.[8] Zhang Huafu, Yuan Yuzhen, Liu Yunyan. Flexible transparent conducting ZAO thin film [J]. Chin. J. Liquid Crystals and Displays (液晶与显示), 2008, 23 (4):489-493 (in Chinese).[9] Sheu J K,Lu Y S, Lee M L, et al. Enhanced efficiency of GaN-based light-emitting diodes with periodic textured Ga-doped ZnO transparent contact layer [J]. Appl. Phys. Lett., 2007, 90 (26):263511-1-3.[10] Nakahara K, Tamura K, Sakai M, et al. Improved external efficiency InGaN-based light-emitting diodes with transparent conductive Ga-doped ZnO as p-electrodes [J]. Jpn. J. Appl. Phys., Part 2: Letters, 2004, 43 (n2A):180-182.[11] Tamura K, Nakahara K, Sakai M, et al. InGaN-based light-emitting diodes fabricated with transparent Ga-doped ZnO as ohmic p-contact [J]. Phys. Stat. Sol. (a), 2004, 201 (12):2704-2707.[12] Nakahara K, Yuji H, Tamura K, et al. Two different features of ZnO: Transparent ZnO ∶ Ga electrodes for InGaN-LEDs and homoepitaxial ZnO films for UV-LEDs [J]. SPIE, 2006, 6122 :61220N-1-18.[13] Jung S P. Investigation of transparent zinc oxide-based contacts for high performance Ⅲ-nitride light emitting diodes . Irvine: University of California, 2005.[14] Lim J H, Hwang D K, Kim H S, et al. Low-resistivity and transparent indium-oxide-doped ZnO ohmic contact to p-type GaN [J]. Phys. Stat. Sol. (a), 2005, 2 (7):2533-2535.[15] Xue Song, Han Yanjun, Guo Wenping, et al. Investigation on surface of p-GaN [J]. Chin. J. Semiconductors (半导体学报), 2003, 24 (12):1280-1282 (in Chinese).[16] Shao Qinghui, Ye Zhizhen, Huang Jingyun. ohmic contacts in GaN-based devices [J]. Materials Review (材料导报), 2003, 17 (3):38-41 (in Chinese).[17] Kalaitzakis F G, Pelekanos N T, Prystawk O P, et al. Low resistance as-deposited Cr/Au contacts on p-type GaN [J]. Appl. Phys. Lett., 2007, 91 (26):1103-1105.[18] Lee J L, Weber M, Kim J K, et al. Ohmic contact formation mechanism of nonalloyed Pd contacts to p-type GaN observed by positron annihilation spectroscopy [J]. Appl. Phys. Lett., 1999, 74 (16):2289-2291.[19] Lee C S, Lin Y J, Lee C T. Investigation of oxidation mechanism for Ohmic formation in Ni/Au contacts to p-type GaN layers [J]. Appl. Phys. Lett., 2001, 79 (23):3815-3817.[20] Chul H, Kim S W, Kim H M, et al. Effect of alcohol-based sulfur treatment on Pt ohmic contacts to p-type GaN [J]. Appl. Phys. Lett., 2001, 78 (13):1942-1944.[21] Jang J S, Seong T Y. Electronic transport mechanisms of nonalloyed Pt ohmic contacts to p-GaN [J]. Appl. Phys. Lett., 2000, 76 (19):2743-2745.[22] Lin Y J, Wang Z L, Chang H C. Surface band bending, nitrogen-vacancy-related defects, and photoluminescence band of (NH4)2Sx-treated p-GaN [J]. Appl. Phys. Lett., 2002, 81 (27):5183-5185.[23] Zhang A P, Luo B, Johnson J W, Ren F, et al. Role of annealing conditions and surface treatment on ohmic contacts to p-GaN and p-Al0.1Ga0.9N/GaN superlattices [J]. Appl. Phys. Lett., 2001, 79 (22):3636-3638.[24] Ishikawa H, Kobayashi S, Koidea Y, et al. Effects of surface treatments and metal work functions on electrical properties at p-GaN/metal interfaces [J]. J. Appl. Phys., 1996, 81 (3):1315-1322.[25] Kim J K, Lee J L, Lee J W, et al. Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment [J]. Appl. Phys. Lett., 1998, 73 (20):2953-2955.
0
浏览量
420
下载量
5
CSCD
关联资源
相关文章
相关作者
相关机构
京公网安备11010802024621