
浏览全部资源
扫码关注微信
1. 北京大学 物理学院
2. 洛阳光电研究所
3. 人工微结构和介观物理国家重点实验室
收稿:2009-04-01,
修回:1900-1-2,
网络首发:2010-02-20,
纸质出版:2010-02-20
移动端阅览
张延召, 秦志新, 桑立雯, 等. In气氛下晶体生长对Mg掺杂p-AlxGa1-xN激活能的影响[J]. 发光学报, 2010,31(1):91-95.
ZHANG Yan-zhao, QIN Zhi-xin, SANG Li-wen, et al. Influence of Indium Doping on Acceptor Activation Energy in p-type AlxGa1-xN[J]. Chinese Journal of Luminescence, 2010, 31(1): 91-95.
Ⅲ-Ⅴ族氮化物宽禁带半导体材料体系中
普通方法生长的p型外延层电导率一般都很低
成为了制约器件性能提高的瓶颈。在p-Al
x
Ga
1-x
N材料中
Mg受主的激活能较大
并且随Al组份增加而增大。通过在p-Al
x
Ga
1-x
N材料生长过程中引入三甲基铟(TMIn)
发现能有效地降低Al
x
Ga
1-x
N材料中受主态的激活能。为研究不同In气氛下生长的p-Al
x
Ga
1-x
N材料的性质
在使用相同二茂基镁(CP2Mg)的情况下
改变TMIn流量
生长了A
B
C和D四块样品。X射线衍射(XRD)组份分析表明:在1 100 ℃下生长Al
x
Ga
1-x
N外延层时
In的引入不会影响晶体组份。利用变温霍尔(Hall)测试研究了p-Al
x
Ga
1-x
N材料中受主的激活能
结果表明:In气氛下生长的外延层相比无In气氛下生长的外延层
受主激活能明显降低
电导率显著提高。采用这种方法改进深紫外发光二极管(LED)的p-Al
x
Ga
1-x
N层后
LED器件性能明显提高。
paper
. Nishida Toshio, Saito Hisao, Kobayashi Naoki. Efficient and high-power AlGaN-based ultraviolet light-emitting diode grown on bulk GaN [J]. Appl. Phys. Lett., 2001, 79 (6):711-713.
. WalKer D, Zhang X, Saxler A, et al. AlxGa1-xN ultraviolet photodetectors grown on sapphire by metal-organic chemical-vapor deposition [J]. Appl. Phys. Lett., 1997, 70 (8):949-951.
. Zhou Xurong, Qin Zhixin, Lu Lin, et al. The influence of GaN/AlxGa1-xN superlattice(SLs) interlayer(IL) on the strain and threading dislocations(TDs) density of AlxGa1-xN grown on GaN/sapphire [J]. Chin. J. Lumin. (发光学报), 2008, 29 (4):701-706 (in Chinese).
. Nam K B, Nakarmi M L, Li J, et al. Mg acceptor level in AlN probed by deep ultraviolet photoluminescence [J]. Appl. Phys. Lett., 2003, 83 (5):878-890.
. Nakarmi M L, Kim K H, Li J, et al. Enhanced p-type conduction in GaN and AlGaN by Mg-delta-doping [J]. Appl. Phys. Lett., 2003, 82 (18):3041-3043.
. Saxler A, Mitchel W C, Kung P, et al. Aluminum gallium nitride short-period superlattices doped with magnesium [J]. Appl. Phys. Lett., 1999, 74 (14):2023-2025.
. Kim K S, Yang G M, Lee H J. The study on the growth and properties of Mg doped and Mg-Si codoped p-type GaN [J]. Solid-State Electron., 1999, 43 (6):1807-1812.
. Wu R Q, Shen L, Yang M, et al. Enhancing hole concentration in AlN by Mg ∶ O codoping: Ab initio study [J]. Phys. Rev. B, 2008, 77 (7):073203-1-4.
. Kim K S, Han M S, Yang G M, et al. Codoping characteristics of Zn with Mg in GaN [J]. Appl. Phys. Lett., 2000, 77 (7):1123-1125.
. Sang L W, Qin Z X, Fang H, et al. Reduction in threading dislocation densities in AlN epilayer by introducing a pulsed atomic-layer epitaxial buffer layer [J]. Appl. Phys. Lett., 2008, 93 (12):122104-1-3.
. Tamulaitis G, Kazlauskas K, Jursenas S, et al. Optical bandgap formation in AlInGaN alloys [J]. Appl. Phys. Lett., 2000, 77 (14):2136-2138.
. Altahtamouni T M, Sedhain A, Lin J Y, et al. Si-doped high Al-content AlGaN epilayers with improved quality and conductivity using indium as a surfactant [J]. Appl. Phys. Lett., 2008, 92 (9):092105-1-3.
. Katayama-Yoshida H, Nishimatsu T, Yamamoto T, et al. Comparison between the theoretical prediction of codoping and the recent experimental evidences in p-type GaN AlN ZnSe CuInS2 and n-type diamond [J]. Phys. Stat. Sol. (b), 1998, 210 (40):429-436.
. Katayama-Yoshida H, Nishimatsu T, Yamamoto T, et al. Codoping method for the fabrication of low-resistivity wide band-gap semiconductors in p-type GaN p-type AlN and n-type diamond: prediction versus experiment [J]. J. Phys.: Condens. Matter, 2001, 13 :8901-8914.
. Adam M. Payne, David Nicol, Hun Kang, et al. Investigation of molecular co-doping for low ionization energy p-type centers in GaN [J]. Phys. Stat. Sol. C, 2005, 2 (7):2463-2467.
0
浏览量
213
下载量
0
CSCD
关联资源
相关文章
相关作者
相关机构
京公网安备11010802024621