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长春理工大学 理学院
收稿:2009-01-25,
修回:1900-1-2,
网络首发:2009-10-30,
纸质出版:2009-10-30
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王 新, 向 嵘, 李 野, 等. 膜层厚度对蓝宝石衬底上生长的ITO薄膜性质的影响[J]. 发光学报, 2009,30(5):712-716.
WANG Xin, XIANG Rong, LI Ye, et al. Effects of Thickness on the Properties of ITO Thin Films Grown on Sapphire Substrate[J]. Chinese Journal of Luminescence, 2009, 30(5): 712-716.
采用磁控溅射的方法在蓝宝石衬底上制备了氧化铟锡(ITO)透明氧化物薄膜;研究了不同厚度薄膜的结构、光学和电学特性。经X射线衍射(XRD)测量
发现在蓝宝石衬底上生长的ITO薄膜呈现了较高的(222)择优取向;随着膜层厚度的增加
该衍射峰对应的2
θ
衍射角逐渐向大角度方向移动
同时该衍射峰的半峰全宽逐渐减小
平均晶粒尺寸增大。 经光学透射光谱测量
发现随着膜层厚度的增加
光学透过率逐渐减小。膜层厚度为0.2 μm时
可见光透过率超过80%
当膜层厚度为0.8 μm时
可见光透过率下降到60%。电学测量结果表明
随着膜层厚度的增加
薄膜电阻率逐渐减小。膜层厚度为0.2 μm时
电阻率为9×10
-4
Ω·cm
膜层厚度为0.8 μm时
电阻率为5.5×10
-4
Ω·cm。
paper
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