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北京交通大学光电子技术研究所, 发光与光信息技术教育部重点实验室 北京,100044
收稿日期:2008-12-25,
修回日期:1900-01-02,
网络出版日期:2009-06-30,
纸质出版日期:2009-06-30
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杜玙璠, 衣立新, 王申伟, 等. Ce3+注入对不同尺寸的nc-Si/SiO2 超晶格发光特性的影响[J]. 发光学报, 2009,30(3):417-420.
DU Yu-fan, YI Li-xin, WANG Shen-wei, et al. Effect of Si Nanocrystals Size on Photoluminescence Intensity of Si Nanocrystals Embedded in Si/SiO2 Superlattices after Ce3+ Implantation[J]. Chinese journal of luminescence, 2009, 30(3): 417-420.
杜玙璠, 衣立新, 王申伟, 等. Ce3+注入对不同尺寸的nc-Si/SiO2 超晶格发光特性的影响[J]. 发光学报, 2009,30(3):417-420. DOI:
DU Yu-fan, YI Li-xin, WANG Shen-wei, et al. Effect of Si Nanocrystals Size on Photoluminescence Intensity of Si Nanocrystals Embedded in Si/SiO2 Superlattices after Ce3+ Implantation[J]. Chinese journal of luminescence, 2009, 30(3): 417-420. DOI:
通过电子束蒸发方法以及高温退火处理
得到nc-Si/SiO
2
超晶格。将样品分别注入剂量为2.0×10
14
cm
-2
和2.0×10
15
cm
-2
的Ce
3+
再对其进行二次退火处理
获得多组样品。通过对样品光致发光光谱的分析发现
样品发光强度的变化不仅受到Ce
3+
注入剂量的影响
而且也受到nc-Si颗粒大小的影响。在相同注入计量和相同的二次退火处理温度下
nc-Si颗粒较大的样品经Ce
3+
注入后其发光强度增强较为明显。
In this paper
SiO/SiO
2
superlattices samples were prepared on Si substrates by electron beam evaporation
and the thicknesses of SiO layers are 2 nm and 4 nm
4 nm for all the SiO
2
layers. The samples were annealed in nitrogen atmosphere at high temperature subsequently. And then
Ce
3+
with a dose of 2.0×10
14
cm
-2
and 2.0×10
15
cm
-2
respectively was implanted into these samples with formed Si nanocrystals. After Ce
3+
doped
the samples were re-annealing at 600 ℃. The photoluminescence (PL) spectra were observed by the fluorescence spectrometry. The PL spectra showed that the PL intensities of samples were not only dependent on the re-annealing temperature and the dose of Ce
3+
but also dependent on the size of nc-Si. The experiment results proved that when the size of nc-Si is 4 nm; the effect of energy transfer between Ce
3+
and nc-Si is more distinct.
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