原子力显微镜在PLD法制备ZnO薄膜表征中的应用

李丽丽; 梁 齐; 仇旭升; 汪壮兵; 宣晓峰; 于永强

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原子力显微镜在PLD法制备ZnO薄膜表征中的应用

论文 | 更新时间：2020-08-12

- 原子力显微镜在PLD法制备ZnO薄膜表征中的应用
- Application of Atomic Force Microscope in the Characterization of ZnO Thin Films Fabricated by Pulsed Laser Deposition
- 发光学报 2009年30卷第1期页码：63-68
- 作者机构：
  
  合肥工业大学应用物理系,安徽合肥,230009
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： O482.31;TN304.055
- 纸质出版日期：2009-2-20，
  
  网络出版日期：2009-2-20，
  
  收稿日期：2008-7-17，
  
  修回日期：1900-1-2，
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李丽丽, 梁齐, 仇旭升, 等. 原子力显微镜在PLD法制备ZnO薄膜表征中的应用[J]. 发光学报, 2009,30(1):63-68.

LI Li-li, LIANG Qi, QIU Xu-sheng, et al. Application of Atomic Force Microscope in the Characterization of ZnO Thin Films Fabricated by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2009,30(1):63-68.
李丽丽, 梁齐, 仇旭升, 等. 原子力显微镜在PLD法制备ZnO薄膜表征中的应用[J]. 发光学报, 2009,30(1):63-68. DOI：

LI Li-li, LIANG Qi, QIU Xu-sheng, et al. Application of Atomic Force Microscope in the Characterization of ZnO Thin Films Fabricated by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2009,30(1):63-68. DOI：

摘要

利用脉冲激光沉积(PLD)法在氧压为16 Pa、衬底温度为400~700 ℃时

在单晶Si(100) 衬底上制备ZnO薄膜

并通过原子力显微镜(AFM)、X射线衍射(XRD)谱和光致发光谱对制得的薄膜样品进行表面形貌、结构特性和发光性质研究。其中通过原子力显微镜对样品的二维、三维以及剖面线图进行了分析。结果表明衬底温度700 ℃时得到的薄膜样品表面较均匀致密

晶粒生长较充分

结晶质量较高

相对发光强度高。控制氧压为5.7 Pa

在衬底温度为600 ℃

沉积时间分别为10

45 min制备ZnO薄膜样品;利用原子力显微镜对样品进行表面形貌观察

得知只有沉积时间足够长才能使薄膜表面晶粒充分生长。

Abstract

Zinc oxide

which is a direct wide band-gap(3.37 eV) compound semiconductor with the large exciton binding energy(60 meV)

has recently become a very popular material due to its good photoelectric and piezoelectric properties.Besides

the pulsed laser deposition(PLD) technique has its unique advantages such as high controllability of film composition

the easy control of experimental parameters and an inherently clean process which make it easy to deposit high-quality complex compound films.The dependence of the surface morphology

crystalline quality and photoluminescence property of the ZnO films prepared by pulsed laser deposition on the growth temperature and the dependence of the surface morphology of the samples on the different deposition time were investigated in this paper. The ZnO thin films were fabricated on Si(100) substrates by pulsed laser deposition in temperature ranging from 300 ℃ to 700 ℃ at a oxygen ambient pressure of 16 Pa. The surface morphology

the structural characteristics and the optical property of ZnO thin films were characterized by atomic force microscopy(AFM)

X-ray diffraction(XRD) and PL spectra. The two-dimensional images

three-dimensional images and profiles of the samples were analyzed by AFM. The results indicated that the surface roughness of the films increased at first and decreased later

the quality of crystallization is improved gradually and photoluminescence property is also enhanced.It was found that the film grown at 700 ℃ has a much smoother and denser morphology

ideal crystalline quality and better optical properties. Other ZnO thin films were fabricated at an oxygen ambient pressure of 5.7 Pa in the growth time ranging from 10 to 45 min. Using AFM

we understood that it is important to have crystalline grains grown adequately in a sufficient period of time.

关键词

ZnO薄膜脉冲激光沉积原子力显微镜X射线衍射光致发光

Keywords

ZnO thin filmPLDAFMXRDphotoluminescence

references

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