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1. 长春理工大学, 生命科学技术学院
2. 大连理工大学, 三束国家重点实验室, 物理与光电工程学院
收稿:2007-08-25,
修回:2007-11-15,
纸质出版:2008-03-20
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翁占坤, 刘爱民, 刘艳红, 胡增权. n型InP(100)衬底上电沉积氧化锌薄膜的制备及光致发光[J]. 发光学报, 2008,29(2): 283-288
WENG Zhan-kun, LIU Ai-min, LIU Yan-hong, HU Zeng-quan. Photoluminescence and Formation of ZnO Thin Films on n-InP(100) by Electrodeposition[J]. Chinese Journal of Luminescence, 2008,29(2): 283-288
采用电化学沉积方法在n型InP(100)(1016)衬底上制备了氧化锌薄膜。探索线性扫描伏安法确定InP与0.1mol/LZn(NO
3
)
2
电解液的体系中沉积氧化锌的极化电势
在20℃溶液中
相对于甘汞电极(SCE)的极化电势为-1.1877V。扫描电镜照片显示:随着应用电势的降低
氧化锌薄膜变得紧密平滑;狭窄的X射线衍射峰也说明低电势下薄膜的结晶质量较好。光荧光表征发现低电势下制备的氧化锌薄膜具有良好的发光特性。
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