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1. 四川师范大学物理与电子工程学院, 固体物理研究所低维结构物理实验室
2. 重庆邮电大学, 光电工程学院
收稿:2007-07-11,
修回:2007-9-23,
纸质出版:2008-03-20
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陈青云, 段满益, 周海平, 董成军, 魏屹, 纪红萱, 黄劲松, 陈卫东, 徐明. Si/SiN<sub>x</sub>/SiO<sub>2</sub>多层膜的光致发光[J]. 发光学报, 2008,29(2): 363-370
CHEN Qing-yun, DUAN Man-yi, ZHOU Hai-ping, DONG Cheng-jun, WEI Yi, JI Hong-xuan, HUANG Jin-song, CHEN Wei-dong, XU Ming. Photoluminescence of Si/SiN<sub>x</sub>/SiO<sub>2</sub> Multilayers[J]. Chinese Journal of Luminescence, 2008,29(2): 363-370
陈青云, 段满益, 周海平, 董成军, 魏屹, 纪红萱, 黄劲松, 陈卫东, 徐明. Si/SiN<sub>x</sub>/SiO<sub>2</sub>多层膜的光致发光[J]. 发光学报, 2008,29(2): 363-370 DOI:
CHEN Qing-yun, DUAN Man-yi, ZHOU Hai-ping, DONG Cheng-jun, WEI Yi, JI Hong-xuan, HUANG Jin-song, CHEN Wei-dong, XU Ming. Photoluminescence of Si/SiN<sub>x</sub>/SiO<sub>2</sub> Multilayers[J]. Chinese Journal of Luminescence, 2008,29(2): 363-370 DOI:
采用射频磁控溅射法
制备了具有强光致可见发光的纳米Si/Si/SiN
x
/SiO
2
多层膜
利用傅立叶红外吸收(FTIR)谱
光致发光(PL)谱对其进行了研究。用260nm光激发得到的PL谱中观察到高强度的392nm(3.2eV)和670nm(1.9eV)光致发光峰
分析认为它们分别来自于缺陷态≡Si-到价带顶和从导带底到缺陷态≡Si-的辐射跃迁而产生的光致激发辐射复合发光。PL谱中只有370nm(3.4eV)处发光峰的峰位会受退火温度的影响
结合FTIR谱认为370nm发光与低价氧化物-SiOx(x
<
2. 0)结合体有密不可分的关系。当SiO
2
层的厚度增大时
发光强度有所增强
800℃退火后出现最强发光
认为具有较大SiO
2
层厚度的Si/Si/SiN
x
/SiO
2
结构多层膜更有利于退火后形成Si-N网络
能够得到更高效的光致发光。用量子限制-发光中心(QCLC)模型解释了可能的发光机制
并建立了发光的能隙态(EGS)模型。
Canham L T.Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers[J].Appl.Phys.Lett.,1990,57(10):1046-1048.[2] Lin K C,Lee S C.The structural and optical properties of a-Si/SiNx:H prepared by plasma enhanced chemical-vapor deposition[J].J.Appl.Phys.,1992,72(11):5475-5482.[3] Iwayama T S,Nakao S,Saitoh K.Visible photoluminescence in Si+-implanted thermal oxide films on crystalline Si[J].Appl.Phys.Lett.,1994,65(14):1814-1816.[4] Lu Z H,Lockwood D J,Baribeau J M.Quantum confinement and light emission in SiO2/Si superlattices[J].Nature (London),1995,378(6554):258-260.[5] Xu M,Xu S,Huang S Y,et al.Growth and visible photoluminescence of SiCxNy/AlN nanoparticle superlattices[J].Physica E,2006,35:81-87.[6] Masuda A,Itoh K,Matsuda K,et al.Nitrogen-doping effects on electrical,optical,and structural properties in hydro-genated amorphous silicon[J].J.Appl.Phys.,1997,81(10):6729-6737.[7] Shi Mingji,Li Qingshan,Kong Xianggui.Structural and optical characteristics of nano-crystalline silicon films fabricated by pulsed laser deposition[J] Chin.J.Lumin.(发光学报),2006,27(6):681-686 (in Chinese).[8] Chen Chao,Liu Yuzhen,Zhang Guobin,et al.Photoluminescence of SiCN thin films prepared by C+ implantation into amorphous Si/SiNx:H[J].Chin.J.Lumin.(发光学报),2007,28(4):579-584 (in Chinese).[9] Hirschman K D,Tsybeskov L,Duttagupta S P,et al.Silicon-based visible light-emitting devices integrated into microelectronic circuits[J].Nature (London),1996,384(6607):338-341.[10] Pavesi L,Negro L D,Mazzoleni C,et al.Optical gain in silicon nanocrystals[J].Nature (London),2000,408(6811):440-444.[11] Serincan U,Kulakci M,Turan R,et al.Variation of photoluminescence from Si nanostructures in SiO2 matrix with Si+ post implantation[J].Nuclear Instruments and Methods in Physics Research B,2007,254(1):87-92.[12] Augustine B H,Hu Y Z,Irene E A,et al.An annealing study of luminescent amorphous silicon-rich silicon oxynitride thin films[J].Appl.Phys.Lett.,1995,67(25):3694-3696.[13] Mchedlidze T,Arguirov T,Kittler M,et al.Structural and optical properties of Si/SiO2 multi-quantum wells[J].Physica E,2007,38(1-2):152-155.[14] Chen K J,Ma Z Y,Huang X F,et al.Comparison between light emission from Si/Si/SiNx and Si/SiO2 multilayers:role of interface states[J].J.Non-Crystalline Solids,2004,338-340:448-451.[15] Modreanu M,Gartner M,Aperathitis E,et al.Investigation on preparation and physical properties of nanocrystalline Si/SiO2 superlattices for Si-based light-emitting devices[J].Physica E,2003,16(3-4):461-466.[16] Nihonyanagi S,Nishimoto K,Kanemitsu Y.Visible photoluminescence and quantum confinement effects in amorphous Si/SiO2 multilayer structures[J].J.Non-Crystalline Solids,Part 2,2002,299-302:1095-1099.[17] Yi L X,Scholz R,Zacharias M.Size and density control of Si-nanocrystals realized by SiOx/SiO2 superlattice[J].J.Lumin.,2007,122-123:750-752.[18] Xu M,Xu S,Ee Y C,et al.Visible photoluminescence from the annealed TEOS SiO2[J].Materials Science and Engineering B,2006,128(1-3):89-92.[19] Xu M,Xu S,Chai J W,et al.Enhancement of visible photoluminescence in the Si/SiNx films by SiO2 buffer and annealing[J].Appl.Phys.Lett.,2006,89(25):251904-1-3.[20] Aydmh A,Serpengfizel A,Vardar D.Visible photoluminescence from low temperature deposited hydrogenated amorphous silicon nitride[J].Solid State Communications,1996,98(4):273-274.[21] John G C,Singh V A.Theory of the photoluminescence spectra of porous silicon[J].Phys.Rev.B,1994,50(8):5329-5334.[22] Lockwood D J,Lu Z H,Baribeau J M.Quantum confined luminescence in Si/SiO2 superlattices[J].Phys.Rev.Lett.,1996,76(3):539-541.[23] Cullis A G,Canham L T,Calcott P D J.The structural and luminescence properties of porous silicon[J].J.Appl.Phys.,1997,82(3):909-965.[24] Kanemitsu Y,Okamoto S.Resonantly excited photoluminescence from porous silicon:Effects of surface oxidation on resonant luminescence spectra[J].Phys.Rev.B,1997,56(4):R1696-R1699.[25] Guha S,Pace M D,Dunn D N,et al.Visible light emission from Si nanocrystals grown by ion implantation and subsequent annealing[J].Appl.Phys.Lett.,1997,70(10):1207-1209.[26] Huo K,Ma Y,Hu Y,et al.Synthesis of single-crystalline a-Si3N4 nanobelts by extended vapour-liquid-solid growth[J].Nanotechnology,2005,16(10):2282-2287.[27] Zeng Youhua,Guo Hengqun,Wang Qiming.Preparation and photoluminescent properties of Si-rich silicon nitride thin films[J].Semiconductor Optoelectronics (半导体光电),2007,28(2):209-212 (in Chinese).[28] Yang X,Wu X L,Li S H,et al.Origin of the 370-nm luminescence in Si oxide nanostructures[J].Appl.Phys.Lett.,2005,86(20):201906-1-3.[29] Gritsenko V A,Zhuravlev K S,Milov A D,et al.Silicon dots/clusters in silicon:photoluminescence and electron spin resonance[J].Thin Solid Films,1999,353(1-2):20-24.[30] Kim T W,Cho C H,Kim B H,et al.Quantum confinement effect in crystalline silicon quantum dots in silicon nitride grown using SiH4 and NH3[J].Appl.Phys.Lett.,2006,88(12):123102-1-3.[31] Mo C,Zhang L,Xie C,et al.Luminescence of nanometer-sized amorphous silicon nitride solids[J].J.Appl.Phys.,1993,73(10):5185-5188.[32] Qin G G,Li Y J.Photoluminescence mechanism model for oxidized porous silicon and nanoscale-silicon-particle-embedded silicon oxide[J].Phys.Rev.B,2003,68(8):085309-1-7.[33] Brodsky M H.Quantum well model of hydrogenated amorphous silicon[J].Solid State Commun.,1980,36(1):55-59.[34] Ma L B,Song R,Miao Y M,et al.Blue-violet photoluminescence from amorphous Si-in-Si/SiNx thin films with external quantum efficiency in percentages[J].Appl.Phys.Lett.,2006,88(9):093102-1-3.[35] Robertson J.Electronic structure of silicon nitride[J].Philos.Mag.B,1991,63(1):47-77.
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