Polarity Control and Threading Dislocation Reduction in RF-MBE Grown GaN on Sapphire Substrates
发光学报2001年22卷第4期 页码:319-323
作者机构:
1. Sophia University 7-1, Kioi-cho, Chiyoda-, Tokyo
2. Sophia University 7-1, Kioi-cho, Chiyoda-ku, Tokyo 102-8554, Japan
作者简介:
基金信息:
Project supported by the "Research for the Future" program of the Japan Society for
DOI:
中图分类号:TN312.8
纸质出版:2001-11-30
稿件说明:
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Kishino K, Kikuchi A . 蓝宝石衬底上RF-MBE生长的GaN中的极性控制和螺旋位错的降低[J]. 发光学报, 2001,22(4): 319-323
Kishino K, Kikuchi A. Polarity Control and Threading Dislocation Reduction in RF-MBE Grown GaN on Sapphire Substrates[J]. Chinese Journal of Luminescence, 2001,22(4): 319-323
Kishino K, Kikuchi A . 蓝宝石衬底上RF-MBE生长的GaN中的极性控制和螺旋位错的降低[J]. 发光学报, 2001,22(4): 319-323DOI:
Kishino K, Kikuchi A. Polarity Control and Threading Dislocation Reduction in RF-MBE Grown GaN on Sapphire Substrates[J]. Chinese Journal of Luminescence, 2001,22(4): 319-323DOI: