Growth Method and Growth Condition Dependence of the Polarity of GaN Grown on the GaAs(111) Substrate
发光学报2001年22卷第4期 页码:315-318
作者机构:
1. National Institute for Research in Inorganic Materials, Tsukuba 305-0044, Japan
2. University of Tsukuba, Institute of Applied Physics, Tsukuba 305-8573, Japan
作者简介:
基金信息:
Project supported by a Grant-in-Aid for Scientific Research(B)(09555002) from the Mi
DOI:
中图分类号:TN312.8
收稿日期:2001-03-17,
修回日期:2001-07-20,
纸质出版日期:2001-11-30
稿件说明:
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Hasegawa F, Souda R . GaAs(111)衬底上生长的GaN的极性与生长方法和生长条件的关系[J]. 发光学报, 2001,22(4): 315-318
Hasegawa F, Souda R. Growth Method and Growth Condition Dependence of the Polarity of GaN Grown on the GaAs(111) Substrate[J]. Chinese Journal of Luminescence, 2001,22(4): 315-318
Hasegawa F, Souda R . GaAs(111)衬底上生长的GaN的极性与生长方法和生长条件的关系[J]. 发光学报, 2001,22(4): 315-318DOI:
Hasegawa F, Souda R. Growth Method and Growth Condition Dependence of the Polarity of GaN Grown on the GaAs(111) Substrate[J]. Chinese Journal of Luminescence, 2001,22(4): 315-318DOI:
Dependence of polarity of hexagonal GaN on that of GaAs(111) substrates was investigated.GaN grown by MOVPE and MOMBE with a high Ⅴ/Ⅲ ratio followed polarity of the GaAs substrate;a layer grown on the(111) A-Ga-surface showed Ga polarity and that on the(111) B-As-surface showed N polarity.However
GaN grown on GaAs(111) B surface showed Ga polarity when the layer was grown by HVPE
MOMBE with a low Ⅴ/Ⅲ ratio
or with an AIN intermediate layer.The reason is not made clear yet
but these results suggest that HVPE growth or an MN high temperature buffer layer gives a better quality GaN.