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河北大学, 物理科学与技术学院, 河北, 保定, 071002
收稿:2004-08-20,
修回:2004-11-24,
纸质出版:2006-01-20
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董国义, 窦军红, 韦志仁, 葛世艳, 郑一博, 林琳, 田少华. ZnS中电子陷阱能级对光生电子弛豫过程的影响[J]. 发光学报, 2006,27(1): 31-35
DONG Guo-yi, DOU Jun-hong, WEI Zhi-ren, GE Shi-yan, ZHENG Yi-bo, LIN lin, TIAN Shao-hua. Effect of Electron Traps in ZnS on the Decay Process of Photoelectrons[J]. Chinese Journal of Luminescence, 2006,27(1): 31-35
董国义, 窦军红, 韦志仁, 葛世艳, 郑一博, 林琳, 田少华. ZnS中电子陷阱能级对光生电子弛豫过程的影响[J]. 发光学报, 2006,27(1): 31-35 DOI:
DONG Guo-yi, DOU Jun-hong, WEI Zhi-ren, GE Shi-yan, ZHENG Yi-bo, LIN lin, TIAN Shao-hua. Effect of Electron Traps in ZnS on the Decay Process of Photoelectrons[J]. Chinese Journal of Luminescence, 2006,27(1): 31-35 DOI:
采用微波吸收法
测量了在不同助熔剂条件及不同气氛下烧制的ZnS材料受到超短激光脉冲激发后的光电子衰减过程
并且测量了材料的热释光曲线。样品A采用过量的SrCl作为助熔剂
在1150℃下灼烧制备而成;其热释光曲线显示材料中有浅电子陷阱
电子陷阱密度小
光生电子衰减过程为双指数衰减过程
快过程寿命为45ns
慢过程寿命为312ns。样品B中加入了少量的NaCl作为助熔剂;热释光曲线显示有浅电子陷阱和深电子陷阱
且都有较高的密度
其光电子寿命为1615ns。在NH
4
Br气氛中烧制样品C
热释光谱显示只有浅电子陷阱形成
光电子寿命为1413ns。结果表明材料的光电子寿命和浅电子陷阱密切相关
浅电子陷阱密度越大
光生电子寿命越长
深电子陷阱对光生电子瞬态过程影响很小。
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