Encapsulation of Quantum-dot Color Conversion Films Based on Atomic Layer Deposition

YAN Yinguo; CAI Junhu; ZHOU Xiaojian; CHEN Enguo; XU Sheng; YE Yun; GUO Tailiang

doi:10.37188/CJL.20230012

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Encapsulation of Quantum-dot Color Conversion Films Based on Atomic Layer Deposition

Luminescence Industry and Technology Frontier | 更新时间：2023-10-27

- Encapsulation of Quantum-dot Color Conversion Films Based on Atomic Layer Deposition
  增强出版
- Chinese Journal of Luminescence Vol. 44, Issue 6, Pages: 1059-1068(2023)
- 作者机构：
  
  1.福州大学物理与信息工程学院，平板显示技术国家地方联合工程实验室，福建福州　350108
  2.中国福建光电信息科学与技术创新实验室（闽都创新实验室），福建福州　350108
- 作者简介：
- 基金信息：
  
  National Natural Science Foundation of China(62175032);Fujian Provincial Natural Science Foundation Project(2021J01579);Fujian Provincial key science and technology Project(2021HZ021001);Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China(2020ZZ111)
- DOI：10.37188/CJL.20230012
  CLC： O484.5
- Published：05 June 2023，
  
  Received：19 January 2023，
  
  Revised：19 February 2023，
- 稿件说明：
移动端阅览
严银菓,蔡俊虎,周小健等.基于原子层沉积的量子点色彩转换膜封装[J].发光学报,2023,44(06):1059-1068.

YAN Yinguo,CAI Junhu,ZHOU Xiaojian,et al.Encapsulation of Quantum-dot Color Conversion Films Based on Atomic Layer Deposition[J].Chinese Journal of Luminescence,2023,44(06):1059-1068.
严银菓,蔡俊虎,周小健等.基于原子层沉积的量子点色彩转换膜封装[J].发光学报,2023,44(06):1059-1068. DOI： 10.37188/CJL.20230012.

YAN Yinguo,CAI Junhu,ZHOU Xiaojian,et al.Encapsulation of Quantum-dot Color Conversion Films Based on Atomic Layer Deposition[J].Chinese Journal of Luminescence,2023,44(06):1059-1068. DOI： 10.37188/CJL.20230012.

摘要

量子点色转换是实现新型显示器件全彩化和提升显示色域的一种有效策略，但量子点环境稳定性差限制了其应用和发展。本文基于具有自限制表面反应特性的原子层沉积工艺，探索了在量子点色彩转换膜上原位生长致密的氧化铝封装膜，该封装方法将具有高光透过率、高致密的材料与贴合紧密的工艺有效结合。仿真结果表明，氧化铝封装的量子点色彩转换膜的出光强度达到了未封装的94.9%。并且，实验结果也表明，氧化铝封装基板的光透过率是空白基板的96.4%，而且封装后的量子点色彩转换膜在高温高湿（85 ℃，85% RH）环境中工作240 h后，光转换效率仍然保持初始的60.8%，比未封装的光转换效率（11.43%）提升了63.9%。该封装方法实现了在量子点色彩转换膜出光强度不受影响的同时，有效提升量子点色彩转换膜的稳定性，为量子点色彩转换膜的稳定性提升提供了一条可行思路，同时扩展了原子层沉积工艺在光电显示领域的应用，具有重要的科学意义和应用前景。

Abstract

Quantum dot color conversion （QDCC） is an effective strategy to realize the full color of new display devices and improve the display color gamut， but the poor environmental stability of QD limits its application and development. Based on the atomic layer deposition（ALD） process with self-limiting surface reaction characteristics， this paper explores the

in⁃situ

growth of dense alumina encapsulation film on a quantum-dot color conversion film （QDCCF）. This encapsulation method effectively combines a high light transmittance and high dense material with a tightly bonded process. The simulation results show that the light intensity of the QDCCF encapsulated by alumina reaches 94.9% of that of the unencapsulated one. Furthermore， the experimental results also show that the light transmittance of the substrate with alumina encapsulation is 96.4% of the blank substrate. Moreover， after working for 240 h in a high temperature and high humidity （85 ℃， 85% RH） environment， the light conversion efficiency of the encapsulated QDCCF remains 60.8% of the initial， which is 63.9% higher than the unencapsulated （11.43%）. The encapsulation method effectively improves the stability of QDCCF while the light intensity is not affected， which provides a feasible idea for improving the stability of QDCCF， and expands the application of ALD process in the field of photoelectric display， which has important scientific significance and application prospects.

关键词

氧化铝原子层沉积量子点色彩转换膜光透过率稳定性。

Keywords

aluminaatomic layer depositionquantum dot color conversion filmlight transmittancestability

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