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Low Temperature 808 nm High Efficiency Semiconductor Laser
Device Fabrication and Physics | 更新时间:2022-05-23
    • Low Temperature 808 nm High Efficiency Semiconductor Laser

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    • Chinese Journal of Luminescence   Vol. 43, Issue 5, Pages: 786-795(2022)
    • DOI:10.37188/CJL.20220025    

      CLC: TN248.4
    • Published:2022-05

      Received:19 January 2022

      Revised:11 February 2022

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  • Shun-hua WU, Guo-jun LIU, Zhen-fu WANG, et al. Low Temperature 808 nm High Efficiency Semiconductor Laser. [J]. Chinese Journal of Luminescence 43(5):786-795(2022) DOI: 10.37188/CJL.20220025.

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Related Author

Shun-hua WU
Te LI
Zhen-fu WANG
Guo-jun LIU
ZHAO Yufei
TONG Cunzhu
WEI Zhipeng
GONG Jian

Related Institution

College of Physics and Electronic Engineering, Key Laboratory of Laser Technology and Optoelectronic Functional Materials of Hainan Province, Hainan Normal University
State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences
State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Changchun 130022, Jinlin
School of Optoelectronic Engineering, Changchun University of Science and Technology
State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
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