National Natural Science Foundation of China(61504167);the Natural Science Foundation of Shaanxi Province,China(2019ZY-CXPT-03-05;2018JM6010;2015JQ6263);the Talent Project of Science and Technology Department of Shaanxi Province(2017KJXX-72);Foundation of State Key Laboratory of High Power Semiconductor Laser of Changchun University of Science and Technology
SHUN-HUA WU, GUO-JUN LIU, ZHEN-FU WANG, et al. Low Temperature 808 nm High Efficiency Semiconductor Laser. [J]. Chinese journal of luminescence, 2022, 43(5): 786-795.
DOI:
SHUN-HUA WU, GUO-JUN LIU, ZHEN-FU WANG, et al. Low Temperature 808 nm High Efficiency Semiconductor Laser. [J]. Chinese journal of luminescence, 2022, 43(5): 786-795. DOI: 10.37188/CJL.20220025.
Low Temperature 808 nm High Efficiency Semiconductor Laser增强出版
In order to improve the performance of 808 nm semiconductor laser operating at low temperature
the temperature dependence of electro-optical conversion efficiency was studied. Combining the suppression of carrier leakage and the optimization of the series resistance
the carrier confinement phenomenon in the quantum well was analyzed theoretically. Moreover
the potential barrier height and the corresponding quantum well structure for low temperature operating were proposed
including the optimization of important parameters such as the material composition and thickness of the barrier layer
which showed significant benefit for operation under low temperature. Basing on the optimized epitaxial structure
semiconductor laser bars with a cavity length of 2 mm were fabricated. Under the temperature of -50 ℃
an electro-optical conversion efficiency of 71% was demonstrated with a slope efficiency of 1.34 W/A and an injection current of 600 A. Record high electro-optical conversion efficiency of 73.5% was reached with the injection current of 400 A
while the carrier confinement efficiency was as high as 99%
and the series resistance was as low as 0.43 mΩ. In the temperature range of -60-60 ℃
the shift coefficient of the center wavelength with temperature was about 0.248 nm/℃.
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Related Institution
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