浏览全部资源
扫码关注微信
长春理工大学 高功率半导体激光国家重点实验室,吉林 长春,130022
收稿日期:2019-05-06,
修回日期:2019-08-06,
网络出版日期:2019-06-04,
纸质出版日期:2019-10-05
移动端阅览
徐雨萌, 薄报学, 高欣. 联氨溶液钝化GaAs(100)表面特性及其发光性能[J]. 发光学报, 2019,40(10): 1234-1239
XU Yu-meng, BO Bao-xue, GAO Xin. Surface and Luminescence Properties of GaAs(100) by Hydrazine Solution Passivation[J]. Chinese Journal of Luminescence, 2019,40(10): 1234-1239
徐雨萌, 薄报学, 高欣. 联氨溶液钝化GaAs(100)表面特性及其发光性能[J]. 发光学报, 2019,40(10): 1234-1239 DOI: 10.3788/fgxb20194010.1234.
XU Yu-meng, BO Bao-xue, GAO Xin. Surface and Luminescence Properties of GaAs(100) by Hydrazine Solution Passivation[J]. Chinese Journal of Luminescence, 2019,40(10): 1234-1239 DOI: 10.3788/fgxb20194010.1234.
为了有效降低GaAs表面态密度,获得稳定的高性能钝化膜,使用联氨溶液钝化GaAs(100)表面。通过光致发光对联氨溶液浓度、Na
2
S浓度和钝化时间进行了优化。联氨溶液钝化后GaAs样品的PL比未处理的增加了1.22倍。采用X射线光电子能谱和原子力显微镜分析了联氨溶液钝化前后GaAs的表面成分和形貌。结果表明,联氨溶液钝化GaAs表面可以有效地去除表面氧化物,形成均匀、平整的GaN钝化层。通过表面稳定性测试发现,钝化后的GaAs表面在空气中放置数天,光致发光强度未见明显的退化(30 d内PL强度降低7%),说明钝化后GaAs表面的稳定性良好。
In order to effectively reduce the density of GaAs surface states and obtain a stable high-performance passivation film
hydrazine solution is used to passivate the surface of GaAs (100).The concentration of hydrazine solution
the Na
2
S concentration
and the passivation time were optimized by photoluminescence. The PL intensity of the hydrazine concentration passivated GaAs samples is 1.22 times higher than non-passivated. The surface composition and morphology of GaAs before and after passivation of hydrazine solution were analyzed by X-ray photon spectroscopy and atomic force microscopy. Experimental results indicate that the surface oxides can be removed by the hydrazine solution effectively
and a uniform
flat GaN passivation layer can be formed on the surface. Through the surface stability measurement
it is found that the PL intensity of passivated GaAs surface does not have obvious degradation after several days in the open air
indicating that the surface of the GaAs after passivation is stable.
LU H H,XU J P,LIU L,et al.. Improved interfacial quality of GaAs metal-oxide-semiconductor device with NH3-plasma treated yittrium-oxynitride as interfacial passivation layer[J]. Microelectron. Reliab., 2016,56:17-21.
EDMONDS M,KENT T,CHAGAROV E,et al.. Passivation of InGaAs(001)-(24) by self-limiting chemical vapor deposition of a silicon hydride control layer[J]. J. Am. Chem. Soc., 2015,137(26):8526-8533.
DALAPATI G K,TONG Y,LOH W Y,et al.. Impact of interfacial layer control using Gd2O3 in HfO2 gate dielectric on GaAs[J]. Appl. Phys. Lett., 2017,90(18):183510-1-3.
HUANG X H,DUBOWSKI J J. Solvent-mediated self-assembly of hexadecanethiol on GaAs (001)[J]. Appl. Surf. Sci., 2014,299:66-72.
LEBEDEV M V,KUNITSYNA E V,CALVET W,et al.. Sulfur passivation of GaSb(100) surfaces:comparison of aqueous and alcoholic sulfide solutions using synchrotron radiation photoemission spectroscopy[J]. J. Phys. Chem. C, 2013,117(31):15996-16004.
GHITA R V,NEGRILA C C,COTIRLAN C,et al.. On the passivation of GaAs surface by sulfide compounds[J]. Dig. J. Nanomater. Bios., 2013,8(3):1335-1344.
LUCERO A T,BYUN Y C,QIN X Y,et al.. Formation of a ZnO/ZnS interface passivation layer on (NH4)2S treated In0.53Ga0.47As:electrical and in-situ X-ray photoelection spectroscopy characterization[J]. Jpn. J. Appls. Phys., 2016,55:08PC02.
KIM S H,KIM G S,KIM J K,et al.. Fermi-level unpinning using a Ge-passivated metal-interlayer-semiconductor structure for non-alloyed ohmic contact of high-electron-mobility transistors[J]. IEEE Electron Device Lett., 2015,36(9):884-886.
周路,初学峰,闫兴振,等. 正十八硫醇钝化GaAs(100)表面特性研究[J]. 发光学报, 2018,39(2):175-179. ZHOU L,CHU X F,YAN X Z,et al.. Passivation of GaAs(100) surface by 1-octadecanethiol[J]. Chin. J. Lumin., 2018,39(2):175-179. (in Chinese)
RⅡKONEN J,SORMUNEN J,KOSKENVAARA H,et al.. Passivation of GaAs surface by ultrathin epitaxial GaN layer[J]. J. Cryst. Growth, 2004,272(1-4):621-626.
李夏南,于乃森,曹保胜,等. 原位SiN</em>x掩膜生长GaN材料的应力及其对光学性质的影响[J]. 液晶与显示, 2010,25(6):776-779. LI X N,YU N S,CAO B S,et al.. Stress and effect on optical properties of GaN epilayers grown by using porous SiN</em>x interlayers[J]. Chin. J. Liq. Cryst. Disp., 2010,25(6):776-779. (in English)
莫春兰,方文卿,王立,等. 硅衬底GaN基LED的研究进展[J]. 液晶与显示, 2005,20(5):422-429. MO C L,FANG W Q,WANG L,et al.. Development of GaN-based LED grown on Si substrate[J]. Chin. J. Liq. Cryst. Disp., 2005,20(5):422-429. (in Chinese)
SORMUNEN J,TOIVONEN J,SOPANEN M,et al.. Morphology of ultra-thin cubic GaN layers on GaAs(100) grown by MOVPE with DMHy as nitrogen source[J]. Appl. Surf. Sci., 2004,222(1-4):286-292.
CHI X W,LAN X L,LU C,et al.. An improvement of HfO2/Ge interface by in situ remote N2 plasma pretreatment for GeMOS devices[J]. Mater. Res. Express, 2016,3(3):035012-1-5.
JIA T T,CHENG X H,CHAO D,et al.. Properties of LaAlO3 thin film on GaAs(100) treated by in situ NH3 plasma[J]. Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms, 2013,307:349-352.
ANTIPOV V G,ZUBRILOV A S,MERKULOV A V,et al.. Molecular beam epitaxy of cubic GaN on a (001) GaAs substrate using hydrazine[J]. Semiconductors, 1995,29(10):946-951.
BERKOVITS V L,PAGET D,KARPENKO A N,et al.. Soft nitridation of GaAs(100) by hydrazine sulfide solutions:effect on surface recombination and surface barrier[J]. Appl. Phys. Lett., 2007,90(2):022104-1-3.
许留洋. 高功率半导体激光器腔面钝化及器件特性研究[D]. 长春:长春理工大学, 2013. XU L Y. Research on Cavity Facet Passivation and Device Characteristics of High Power Semiconductor Laser Diodes[D]. Changchun:Changchun University of Science and Technology, 2013. (in Chinese)
BERKOVITS V L,ULIN V P,LOSURDO M,et al.. Wet chemical nitridation of GaAs (100) by hydrazine solution for surface passivation[J]. Appl. Phys. Lett., 2002,80(20):3739-3741.
BUDZ H A,BIESINGER M C,LAPIERRE R R. Passivation of GaAs by octadecanethiol self-assembled monolayers deposited from liquid and vapor phases[J]. J. Vac. Sci. Technol. B, 2009,27(2):637-648.
LI Y G,WEE A T S,HUAN C H A,et al.. Ion-induced nitridation of GaAs(100) surface[J]. Appl. Surf. Sci., 2001,174(3-4):275-282.
RUPPALT L B,CLEVELAND E R,CHAMPLAIN J G,et al.. Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment[J]. J. Vac. Sci. Technol. B, 2015,33(4):04E102-1-5.
0
浏览量
247
下载量
0
CSCD
关联资源
相关文章
相关作者
相关机构