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深圳大学材料学院 深圳市特种功能材料重点实验室, 深圳陶瓷先进技术工程实验室,广东 深圳,518060
收稿日期:2014-03-01,
修回日期:2014-03-31,
纸质出版日期:2014-06-03
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韩舜, 彭赛, 曹培江等. 不同Ar/O<sub>2</sub>气压比例条件下立方MgZnO薄膜生长特性及紫外光吸收特性[J]. 发光学报, 2014,35(6): 684-688
HAN Shun, PENG Sai, CAO Pei-jiang etc. Growth Orientation and Optical Absorption Characteristics of Cubic MgZnO Thin Films Under Different Ar/O<sub>2</sub> Pressure Ratio Condition by PLD Method[J]. Chinese Journal of Luminescence, 2014,35(6): 684-688
韩舜, 彭赛, 曹培江等. 不同Ar/O<sub>2</sub>气压比例条件下立方MgZnO薄膜生长特性及紫外光吸收特性[J]. 发光学报, 2014,35(6): 684-688 DOI: 10.3788/fgxb20143506.0684.
HAN Shun, PENG Sai, CAO Pei-jiang etc. Growth Orientation and Optical Absorption Characteristics of Cubic MgZnO Thin Films Under Different Ar/O<sub>2</sub> Pressure Ratio Condition by PLD Method[J]. Chinese Journal of Luminescence, 2014,35(6): 684-688 DOI: 10.3788/fgxb20143506.0684.
利用脉冲激光沉积技术在非晶石英衬底上制备了立方结构MgZnO薄膜,研究了在不同Ar/O
2
气压比例条件下,立方结构MgZnO薄膜的生长取向、光学带隙和Mg/Zn含量比例的变化规律。当固定氧气分压为2 Pa、通过注入惰性的Ar气使生长气压从2 Pa升高到7 Pa时,MgZnO薄膜的生长取向由(200)向(111)转变。当生长气压从2 Pa升高到6 Pa时,MgZnO薄膜光学带隙变窄。而当生长气压从6 Pa升高到7 Pa时,MgZnO薄膜光学带隙反而变宽。通过XPS数据分析,不同生长气压下MgZnO薄膜光学带隙的变化规律与薄膜Mg/Zn含量比例的变化规律不一致,MgZnO薄膜中Mg和Zn与O的结合情况的变化对薄膜的光学带隙也有影响。
Mg
1-
x
Zn
x
O thin films were deposited by pulsed laser deposition method. When growth pressure increased through inducing inert Ar during growth process
the migration energy of reactive Mg
Zn and O atoms decreased
the growth orientation of MgZnO thin film shifted from (200) to (111). The band gap value of MgZnO thin films changed with the contents of Mg and Zn atoms that combined with O atoms in MgZnO crystal lattice at different pressure
but not changed with the Mg and Zn content of the whole MgZnO thin films as reported results.
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