应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度

王彤彤

doi:10.3788/fgxb20133411.1489

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应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度

器件制备及器件物理 | 更新时间：2020-08-12

- 应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度
- Roughness Decreasing of Silicon Carbide Hologram-ion Beam Etching Grating by Using Surface Modification Technique
- 发光学报 2013年34卷第11期页码：1489-1493
- 作者机构：
  
  中国科学院长春光学精密机械与物理研究所中国科学院光学系统先进制造技术重点实验室,吉林长春,130033
- 作者简介：
  
  [ "王彤彤(1979-), 男, 吉林长春人, 博士, 主要从事光学薄膜的理论及制备的研究。 E-mail: wangtongtong@126.com, Tel: (0431)86176033" ]
- 基金信息：
  
  国家自然科学基金(60478035)资助项目()
- DOI：10.3788/fgxb20133411.1489
  中图分类号： O484;TN304
- 收稿：2013-08-13，
  
  修回：2013-9-17，
  
  纸质出版：2013-11-10
- 稿件说明：
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王彤彤. 应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度[J]. 发光学报, 2013,34(11): 1489-1493

WANG Tong-tong. Roughness Decreasing of Silicon Carbide Hologram-ion Beam Etching Grating by Using Surface Modification Technique[J]. Chinese Journal of Luminescence, 2013,34(11): 1489-1493
王彤彤. 应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度[J]. 发光学报, 2013,34(11): 1489-1493 DOI： 10.3788/fgxb20133411.1489.

WANG Tong-tong. Roughness Decreasing of Silicon Carbide Hologram-ion Beam Etching Grating by Using Surface Modification Technique[J]. Chinese Journal of Luminescence, 2013,34(11): 1489-1493 DOI： 10.3788/fgxb20133411.1489.

摘要

采用具有良好比刚度和热稳定性的碳化硅材料作为基底

使用全息-离子束刻蚀技术制作了光栅。碳化硅材料表面固有缺陷导致制作的光栅刻槽表面粗糙度高

槽底和槽顶粗糙度分别达到了29.6 nm和65.3 nm (

)。通过等离子辅助沉积技术在碳化硅表面镀制一层均匀的硅改性层

经过抛光可以获得无缺陷的超光滑表面。XRD测试表明制备的硅改性层为无定形结构。原子力显微镜的测试结果表明:经过抛光后

表面粗糙度为0.64 nm(

)。在此表面上制作的光栅刻槽表面粗糙度明显降低

槽底和槽顶粗糙度分别为2.96 nm和7.21 nm

相当于改性前的1/10和1/9。

Abstract

The gratings were fabricated by hologram-ion beam etching technique on the silicon carbide substrate that has fine stiffness and thermal stability. The intrinsic defects of the silicon carbide leads to a rough surface of the grating grooves

the roughness of the bottom and the top of the grating grooves are 29.6 nm and 65.3 nm (

)

respectively. A uniform silicon coating were deposited by Plasma Ion Assisted Deposition (PIAD) technique on the surface of the silicon carbide substrate

then a super smooth surface was obtained after fine polishing. Characterized by XRD

we found the silicon coating is amorphous. After fine polishing

the surface roughness of the silicon carbide is 0.64 nm(

) measuring by AFM. The roughness of the grating grooves are significantly decreased

the roughness of the bottom and the top of the grating grooves are 2.96 nm and 7.21 nm(

)

respectively. Comparing with the grating grooves before surface modification

the roughness of the bottom and the top are 1/10 and 1/9

respectively.

关键词

Keywords

references

Johnson L F, Ingersoll K A. Asymmetric triangular grating profiles with 90 groove angles produced by ion-beam erosion [J]. Appl. Opt., 1981, 20(17):2951-2961.[2] Aoyagi Y, Namba S. Blazed ion-etched holographic gratings [J]. Opt. Acta, 1976, 23(9):701-707.[3] Osterried K, Heidemann K F, Nelles B. Groove profile modification of blazed gratings by dip coating with hardenable liquids [J]. Appl. Opt., 1998, 37(6):8002-8007.[4] De Mello B A, Da Costa I F, Lima C R A, et al. Developed profile of holographically exposed photoresist gratings [J]. Appl. Opt., 1995, 34(10):597-603.[5] Paquin R A, Magida M B, Vernold C L. Large optics from silion carbide [J]. SPIE, 1991, 1618:53-60.[6] Ebizuka N, Eto H, Dai Y, et al. SiC ultra light mirror for large space telescope and for extremely huge ground based telescope Ⅱ [J]. SPIE, 2004, 5487:1013-1017.[7] Chen H, Gao J S, Song Q, et al. Si modified coating on SiC substrate by ion beam assisted deposition [J]. Opt. Precision Eng. (光学精密工程), 2008, 16(3):381-385 (in Chinese).[8] Chen H, Wang T T, Gao J S, et al. Improvement of signal noise ratio of TMC optical system by SiC surface modification technology [J]. Opt. Precision Eng.(光学精密工程), 2009, 17(12):2952-2957 (in Chinese).[9] Wang T T, Gao J S, Wang X Y, et al. Surface modification on a silicon carbide mirror for space application [J]. Chin. Opt. Lett., 2010, 8(z):183-185.[10] Tan X, Liu Y, Xu X D, et al. 13.9 nm Laminar grating as beam splitter [J]. Opt. Precision Eng.(光学精密工程), 2009, 17(1):33-37 (in Chinese).[11] Wu N, Tan X, Bayanheshig, et al. Simulation of ion beam etching process in ion beam etched holographic grating [J]. Opt. Precision Eng.(光学精密工程), 2012, 20(9):1904-1912 (in Chinese).

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