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1. 中国科学院研究生院 北京,100049
2. 中国科学院 激发态物理重点实验室 长春光学精密机械与物理研究所,吉林 长春,130033
收稿日期:2011-01-25,
修回日期:2011-03-24,
网络出版日期:2011-06-22,
纸质出版日期:2011-06-22
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杨晔, 刘云, 秦莉, 张金龙, 彭航宇, 王烨, 李再金, 胡黎明, 史晶晶, 王超, 宁永强, 王立军. 850 nm高亮度锥形半导体激光器的光电特性[J]. 发光学报, 2011,32(6): 593-597
YANG Ye, LIU Yun, QIN Li, ZHANG Jin-long, PENG Hang-yu, WANG Ye, LI Zai-jin, HU Li-ming, SHI Jing-jing, WANG Chao, NING Yong-qiang, WANG Li-jun. Electro-optic Properties of 850 nm High-brightness Tapered Lasers[J]. Chinese Journal of Luminescence, 2011,32(6): 593-597
杨晔, 刘云, 秦莉, 张金龙, 彭航宇, 王烨, 李再金, 胡黎明, 史晶晶, 王超, 宁永强, 王立军. 850 nm高亮度锥形半导体激光器的光电特性[J]. 发光学报, 2011,32(6): 593-597 DOI: 10.3788/fgxb20113206.0593.
YANG Ye, LIU Yun, QIN Li, ZHANG Jin-long, PENG Hang-yu, WANG Ye, LI Zai-jin, HU Li-ming, SHI Jing-jing, WANG Chao, NING Yong-qiang, WANG Li-jun. Electro-optic Properties of 850 nm High-brightness Tapered Lasers[J]. Chinese Journal of Luminescence, 2011,32(6): 593-597 DOI: 10.3788/fgxb20113206.0593.
采用激射波长为850 nm的AlGaInAs/AlGaAs梯度折射率波导分别限制增益量子阱结构的外延片
设计并制备了具有条形结构和锥形结构的半导体激光器。在输出功率同为1 W时
锥形激光器的发散角、光束传播因子和亮度分别为4、2.8和9.9 MWcm
-2
sr
-1
远好于条形激光器的6、9.2和3.0 MWcm
-2
sr
-1
。当外加3 A的脉冲电流时
锥形激光器峰值功率达到1.40 W
斜率效率为0.58 W/A
电光转换效率为30%。实验结果表明
锥形激光器可以在保证大功率输出的前提下
具有更高的光束质量。
High-brightness tapered laser diode at 850 nm was fabricated based on the AlGaInAs/A1GaAs chip with graded-index waveguide separate confinement hetero-structure. The tapered laser has better performance than the broad laser under the same condition. The lateral divergence angles of the tapered laser and the broad laser were 4 and 6 at the output power of 1 W
while the beam propagation factor M
2
were 2.8 and 9.2
respectively. The slope efficiency of the tapered laser had a high value of 0.58 W/A and the conversion efficiency reached 30% in the output power 1.40 W under the injection current of 3 A. The facts indicated the tape-red laser would be an ideal choice for high brightness high power laser diodes.
Zhu Liyan, Fu Xiuhua. The technical development of the 850 nm high-luminance semiconductor laser's film [J]. Journal of Changchun University of Science and Technology (长春理工大学学报), 2007, 30 (1):18-20 (in Chinese).[2] Qu Zhou, Liu Yang, Liu Bo. High power semiconductor laser and its applications in military [J]. OME Information (光机电信息), 2006, 23 (1):52-55 (in Chinese).[3] Liu Yun, Liao Xinsheng, Qin Li, et al. Oxygen-free copper microchannel heat sink of high power semiconductor laser [J]. Chin. J. Lumin. (发光学报), 2005, 26 (1):109-114 (in Chinese).[4] Liang Xuemei1, Lv Jinka, Cheng Liwen, et al. Structural design of vertical-external-cavity surface-emitting semiconductor laser with 920 nm [J]. Chin. J. Lumin. (发光学报), 2010, 31 (1):79-85 (in English).[5] Cheng Liwen, Liang Xuemei, Qin Li, et al. Theoretical analysis of key parameters of 980nm optically pumped semiconductor vertical external cavity surface emitting laser [J]. Chin. J. Lumin. (发光学报), 2008, 29 (4):713-715 (in Chinese).[6] Ma Qiang, Tian Zhenhua, Wang Zhenfu, et al. A theoretical model of high power VCSEL based on the thermal-offset-current [J]. Chin. J. Lumin. (发光学报), 2009, 30 (4):463-466 (in Chinese).[7] Adamiec P, Sumpf B, Rdiger I, et al. Tapered lasers emitting at 650 nm with 1 W output power with nearly diffraction-limited beam quality [J]. Optics Lett., 2009, 34 (16):2456-2458.[8] Dittmar F, Klehr A, Sumpf B, et al. 9 W output power from an 808 nm tapered diode laser in pulse mode operation with nearly diffraction-limited beam quality [J]. IEEE Quantum Electronics, 2007, 13 (5):1194-1199.[9] Kelemen M T, Weber J, Bihlmann G, et al. Tapered diode lasers at 976 nm with 8 W nearly diffraction limited output power [J]. Electronics Lett., 2005, 41 (18):1011-1013.[10] Hwang R Y, Luh S W, Hsu J K, et al. Critical comparison of DH, SCH, and GRIN-SCH-SQW 780 nm ridge-waveguide lasers [J]. SPIE, 1992, 1813 :178-184.[11] Wright D, Greve P, Fleischer J, et al. Laser beam width, divergence and beam propagation factor-an international standardization approach [J]. Optical and Quantum Electronics, 1992, 24 (9):993-1000.
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