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北京交通大学光电子技术研究所 发光与光信息技术教育部重点实验室 北京,100044
收稿日期:2010-01-25,
修回日期:2010-03-15,
网络出版日期:2010-09-21,
纸质出版日期:2010-09-21
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王申伟, 衣立新, 丁甲成, 高靖欣, 王永生. Si基CeO<sub>2</sub>薄膜的发光特性[J]. 发光学报, 2010,31(5): 762-766
WANG Shen-wei, YI Li-xin, DING Jia-cheng, GAO Jing-xin, WANG Yong-sheng. Photoluminescence Properties of Si-based CeO<sub>2</sub> Films[J]. 发光学报, 2010,31(5): 762-766
利用电子束蒸发技术在p型硅衬底上沉积了200 nm厚的CeO
2
薄膜样品
将样品置于弱还原气氛中高温退火后
观察到薄膜在385
418 nm以及445 nm左右出现三个明显的发光峰。结合激发光谱、吸收光谱以及XRD分析表明:CeO
2
薄膜在高温下容易发生失氧反应
出现Ce
4+
Ce
3+
离子转变
Ce
3+
离子在紫外光的激发下
电子由O2p跃迁到5d能级
再由5d能级向4f能级跃迁
从而产生强烈的蓝紫外发射
而445 nm左右的发光峰则来自于SiO
2
薄膜的缺陷发光。样品选择900~1 200 ℃不同温度退火
并且在1 200 ℃下进行了不同时间的退火。研究结果显示:在1 200 ℃下进行2 h的退火
薄膜发光强度达到最大。
CeO
2
films were deposited on p type Si wafers by e-beam evaporation technology. Three photoluminescence peaks which located around 385
418 nm and 445 nm were obtained after annealing in weak redu-cing atmosphere at high temperature. It was indicated that CeO
2
films transferred to amorphous state as the valence conversion of Ce
4+
Ce
3+
which was induced by reducing atmosphere annealing. The PL spectrum of 385 nm and 418 nm was assigned to the transition from 5d energy level of Ce
3+
ions to
2
F
7/2
and
2
F
5/2
manifolds of 4f energy level
respectively
while the peak around 445 nm was assigned to the O vacancies of SiO
2
. Furthermore
the changes of PL intensity in CeO
2
films annealed with different temperature and time were also investigated. The maximum PL intensity was obtained after the films annealing at 1 200 ℃ for 2 h compared with other temperature and time. It was indicated that valence conversion of Ce
4+
Ce
3+
was enhanced by increasing annealing temperature and time
that is
the PL intensity of the films was also enhanced because of the increasing of Ce
3+
ions
however
the energy transfer between Ce
3+
and Ce
3+
ions
occurred as excessive Ce
3+
ions were formed in the films
resulting in concentration quenching.
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