-plane sapphire substrate was etched chemically in the molten KOH solvent at a high temperature with different time
the surface microscopy of pre-treated sapphire substrate was obtained by SEM (Scanning Electronic Microscope) and AFM (Atomic Force Microscope)
followed with the epitaxial GaN on sapphire substrate etched with different etched time. The quality and the microscopy of the epitaxial GaN were characterized using XRD (X-Ray Diffraction) and AFM. Discussion was processed about in which way the etching time affecting the material grown on pre-treated sapphire substrate.
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Keywords
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