氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响

曹培江; 林传强; 曾玉祥; 柳文军; 贾 芳; 朱德亮; 马晓翠; 吕有明

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氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响

论文 | 更新时间：2020-08-12

- 氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响
- Influence of Oxygen Flow Rate on the Morphology and the Optical Properties of Thin ZnO Films Grown by Pulsed Laser Deposition
- 发光学报 2010年31卷第2期页码：239-242
- 作者机构：
  
  深圳大学材料学院深圳市特种功能材料重点实验室
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： O472.3;O482.31
- 收稿：2009-11-25，
  
  修回：1900-1-2，
  
  网络首发：2010-04-30，
  
  纸质出版：2010-04-30
- 稿件说明：
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曹培江, 林传强, 曾玉祥, 等. 氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响[J]. 发光学报, 2010,31(2):239-242.

CAO Pei-jiang, LIN Chuan-qiang, ZENG Yu-xiang, et al. Influence of Oxygen Flow Rate on the Morphology and the Optical Properties of Thin ZnO Films Grown by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2010, 31(2): 239-242.
曹培江, 林传强, 曾玉祥, 等. 氧气流量对脉冲激光沉积ZnO薄膜的形貌及光学性质影响[J]. 发光学报, 2010,31(2):239-242. DOI：

CAO Pei-jiang, LIN Chuan-qiang, ZENG Yu-xiang, et al. Influence of Oxygen Flow Rate on the Morphology and the Optical Properties of Thin ZnO Films Grown by Pulsed Laser Deposition[J]. Chinese Journal of Luminescence, 2010, 31(2): 239-242. DOI：

摘要

使用脉冲激光沉积(PLD)方法在石英(SiO

)和单晶Si(111)基底上制备了具有高

轴择优取向的ZnO薄膜。测试结果显示:在30~70 sccm氧气流量范围内

氧气流量50 sccm时制备的ZnO薄膜具有较好的结晶质量、较高的光学透过率(≥80%)、较高的氧含量(~40.71%)、较快的生长速率(~252 nm/h)和较好的发光特性:450~580 nm附近发射峰最弱

同时~378 nm附近的紫外发光峰最强

表明薄膜材料中含有较少的氧空位等缺陷。

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references

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