浏览全部资源
扫码关注微信
天津工业大学, 信息与通信工程学院 天津,300160
收稿日期:2007-09-02,
修回日期:2008-01-05,
纸质出版日期:2008-03-20
移动端阅览
王小丽, 牛萍娟, 李晓云, 于莉媛, 杨广华, 刘宏伟, 高铁成, 罗惠英, 战瑛, 于欣. 高亮度大功率InGaAlP红光LED芯片研制[J]. 发光学报, 2008,29(2): 330-336
WANG Xiao-li, NIU Ping-juan, LI Xiao-yun, YU Li-yuan, YANG Guang-hua, LIU Hong-wei, GAO Tie-cheng, LUO Hu-ying, ZHAN Ying, YU Xin. The Study of High-brightness and High-power InGaAlP Red LED[J]. Chinese Journal of Luminescence, 2008,29(2): 330-336
王小丽, 牛萍娟, 李晓云, 于莉媛, 杨广华, 刘宏伟, 高铁成, 罗惠英, 战瑛, 于欣. 高亮度大功率InGaAlP红光LED芯片研制[J]. 发光学报, 2008,29(2): 330-336 DOI:
WANG Xiao-li, NIU Ping-juan, LI Xiao-yun, YU Li-yuan, YANG Guang-hua, LIU Hong-wei, GAO Tie-cheng, LUO Hu-ying, ZHAN Ying, YU Xin. The Study of High-brightness and High-power InGaAlP Red LED[J]. Chinese Journal of Luminescence, 2008,29(2): 330-336 DOI:
报道了大功率高亮度InGaAlP红光LED芯片的设计和工艺制备
实验芯片采用环形插指状电极。和传统的LED芯片相比较
环形插指状电极LED芯片电流扩展分布更均匀
而且更有利于与其它器件的集成。对制备好的芯片进行了
I
-
V
特性、光谱特性、光通量和光强的测量。芯片的电性能非常好
其开启电压
V
T
为1.5V;当工作电压达到3V时
工作电流为500mA;在工作电流为350mA时
峰值波长为635nm
半峰全宽为16.4nm
光强为830mcd。在色度学测试中
色坐标为x=0.6943
y=0.3056
显色指数为18.4。因此可以得知高亮度大功率InGaAlP红光LED是未来LED作为普通照明光源应用的第一步
而且将会在科学研究和工业投资的很多应用领域中成为新的焦点。
It is reported that the design and fabrication of high-brightness and high-power InGaAlP ring-shaped interdigitated red LED. High-brightness and high-power InGaAlP LED is a new kind of visible light LED developed in recent years
which is driven by large current capacity
high luminous efficiency and excellent heat resistance. It has been used in various fields
such as large area displays
traffic lights
back-lighting
aviation lighting and so on. As compared with the conventional LED chip
the ring-shaped interdigitated LED chip is more flexible to integrate with other devices
and it leads the more uniform current spreading. The InGaAlP LED epitaxial layer has six layers. From top to bottom
they are the window layer (p-GaP)
the p clad layer(p-InGaAlP)
the active layer between clad layers(i-InGaAlP)
the n clad layer(n-InGaAlP)
distributed Bragg reflectors (DBR) and the n-Substrate(n-GaAs). The epitaxial wafer is tested by scanning electron microscope (SEM) and X-ray double crystal diffraction. The results show the interface of materials is flat
and the integrality and quality of the epitaxial wafer are optimum.The size of chip is 1 mm2.The fabrication of ring-shaped interdigitated LED chip
essentially
is the same as conventional LED chip
involving photolithography
PECVD SiO
2
wet etching
evaporation
lift off and rapid thermal annealing using four masks. To control the widths of mesa and n area precisely
the selecting etch technique has been adopted
using HCL;H
2
O and H
2
O
2
as an InGaAlP etching solution
and the chip is protected by SiO
2
and single layer photoresist during the etching. The fabrication of Ⅲ-Ⅴ compound semiconductor p-type Ohmic contact is more difficult than the fabrication of n-type Ohmic contact. So how to fabricate p-type ohmic contact is a second important technology. AuZn/Au is used to be the p-contact metal in this study
and the chips are sintering for 20 s at 400℃ in N
2
.The
I
-
V
characteristics
light emission spectrum
luminous flux
luminous intensity of this LED have been measured. A good characteristic is obtained with turn-on voltage of 1.5 V and forward current of 500 mA at its forward voltage of 3 V. The peak wavelength is 635 nm
which corresponds to red light
and the full width of half maximum is 16.4 nm at injection current of 350 mA. The luminous intensity is 830 mcd. The color coordinates is x=0.694 3
y=0.305 6 and the color index is 18.4. So we will conclude that the high-brightness and high-power InGaAlP red LED is the first step for a wide scope of general illumination with LED in the future
and it will become new focus in both scientific research and industrial investment for its wide application.
Bhargava R N,Murau P C.Efficient red GaP LED's with compensated p layers[J].J.Appl.Phys.,1974,45(8):3541-3546.
Nishizawa J,Koike M.Efficiency of GaAlAs heterostructure red light-emitting diodes[J] J.Appl.Phys.,1983,54(5):2807-2812.
Yuan J S,Hsu C C,Cohen R M,et al.Organometallic vapor phase epitaxial growth of AlGaInP[J] J.Appl.Phys.,1985,57(4):1380-1383.
Vanderwater D A,Tan I H,Hofler G E,et al.High-brightness AlGaInP light emitting diodes[J].Proceedings of the IEEE,1997,85(11):1752-1764.
Royo P,Stanley R P,Ilegems M.Experimental determination of the internal quantum efficiency of AlGaInP microcavity light-emitting diodes[J].J.Appl.Phys.,2002,91(5):2563-2568.
Klaus Streubel,Norbert Linder,Ralph Wirth,et al.High brightness AlGaInP light-emitting diodes[J] IEEE Journal On Selected Topics In Quantum Electronics,2002,8(2):321-332.
Xu Jianhua Review of Application and prospect of LED technique[J] SCI/TECH Information Development & Economy,2003,13(7):287-288.
Zhang Wansheng Again talk the InGaAlP red light LED problem of our country of development[J] China Illumination(中国照明),2006,1:25-27 (in Chinese).
Gessmann T H,Schubert E F High-efficiency AlGaInP light-emitting diodes for solid-state lighting applications[J] J.Appl.Phys.,2004,95(5):2203-2216.
Bruce R A,Piercy G R An improved Au-Ge-Ni ohmic contact system to n-type GaAs[J] Solid-State Electron,1987,30(7):729-737.
Heiblum M,Nathan M I,Chang C A IVA-6 Characteristics of AuGeNi ohmic contacts to GaAs[J] IEEE Transactions on Electron Devices,1981,28(10):1234-1235.
Yih-Cheng Shih,Masanori Murakami,Wilkie E L,et al.Effects of interfacial microstructure on uniformity and thermal stability of AuGeNi ohmic contact to n-type GaAs[J] J.Appl.Phys.,1987,62(2):582-590.
Mei T.Interpolation of quaternary Ⅲ-Ⅴ alloy parameters with surface bowing estimations[J] J.Appl.Phys.,2007,101(1):013520-1-6.
Li Ping,Liu Shijia,Chen Jiangfeng,et al.Investigation of the interface of Au/Zn/Au/p-InP ohmic contact[J] Semiconductor Technology (半导体技术),2005,30(10):11-14 (in Chinese).
0
浏览量
216
下载量
0
CSCD
关联资源
相关文章
相关作者
相关机构