浏览全部资源
扫码关注微信
长春理工大学, 理学院,吉林 长春,130022
收稿日期:2003-07-21,
修回日期:2003-09-04,
纸质出版日期:2003-11-20
移动端阅览
吴奎, 端木庆铎, 姜德龙, 王国政, 高延军, 李野. 金属UV光敏薄膜的实验研究[J]. 发光学报, 2003,24(6): 650-653
WU Kui, DUANMU Qing-duo, JIANG De-long, WANG Guo-zheng, GAO Yan-jun, LI Ye. Experimental Study on Metal UV Photosensitive Film[J]. Chinese Journal of Luminescence, 2003,24(6): 650-653
介绍了金属Au和Al薄膜的制备方法
研究了其UV光电发射特性
并做了寿命实验
给出了在真空中以及放在大气中光电发射衰减的情况。指出了其在大气中达到一个稳定值之后
再反复多次暴露于干燥大气时仍存在一个稳定光电发射周期的特点
可长达数月。金属薄膜有一个最佳膜层厚度
这与光电发射逸出深度、膜层结构等密切相关。近年来光电子成像器件发展非常迅速
急需光电发射均匀的面电子源
因此在微通道板的特性测试和像管的动态模拟中
Au和Al金属薄膜成为被优选的对象。
Since the Ag-O-Cs (S-l) thin film photoelectric cathodes was discovered in 1930
the polycrys-talline thin films as surface emission electron source were developed in different light sensitive materials
which successfully applied in night vision image tube
photoelectric tube
photo multiplier tube and low level light camera tube
and facilitated the developments of photoelectric and special purpose photoelectric imaging devices.The Sb-Cs and Na-K-Cs-Sb thin films in S series of photoelectric cathodes are limited in application because they have no solar blind characteristics
though they have higher quantum efficiency in the range of near UV (200-380nm).In recent
surface emitters with the stable
homogeneous and no change in photoemission when exposed to air are needed in some conditions.So
the studies on gold (Au)
aluminum (Al) photosensitive films are noticeable in recent years.This paper gave an introduction of preparation of Au and Al thin film and made a study on the characteristics of their UV photoelectric emission.Preparation of metallic photosensitive film is simple.The quartz glass of YS series that has good thermal and chemistry stability was selected as the window in the range of 200-380nm
which has a transmittance to be larger than 85%.Evaporation coating method was used to prepare the metallic film.The film thickness was monitored by the system of testing transmittance or by the measuring apparatus for film thickness based on the theory of quartz vibration.The relationship between the transmittance of white light and the one of UV
and between the transmittance of UV and the photoelectric current density were proposed to be use as a criterion of optimum film thickness.The stability of Au film photoemission is good when exposed to air for many times.Because of it has high chemistry stability.The photoemission of Al film is stable in vacuum
but reduces fast when it was exposed to air and reaches to a definite value for 36 hours as the result of forming a natural oxidation layer.The relationship between thickness and photoemission of Au and Al were given in this paper
In a word
the theory of metal photoemission is relatively in maturity
where Fowler theory can be used as a tool for analyzing and discussing.Practically photoemission mainly depends on the film structure and preparation technology.The surface photoelectron source obtained from Au and Al film will find applications in characteristics test of microchannel plates
dynamic analogue of imaging tube and some special UV imaging devices.
0
浏览量
67
下载量
2
CSCD
关联资源
相关文章
相关作者
相关机构