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1. 中国科学院长春光学精密机械与物理研究所, 激发态物理重点实验室,吉林 长春,130033
2. 长春理工大学, 高功率半导体激光国家重点实验室,吉林 长春,130022
收稿:2002-09-05,
修回:2002-12-13,
纸质出版:2003-07-20
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王晓华, 单崇新, 张振中, 张吉英, 范希武, 吕有明, 刘益春, 申德振. LP-MOCVD生长(ZnCdTe,ZnSeTe)/ZnTe复合量子阱的激子发光研究[J]. 发光学报, 2003,24(4): 371-374
WANG Xiao-hua, SHAN Chong-xin, ZHANG Zhen-zhong, ZHANG Ji-ying, FAN X W, LÜ You-ming, LIU Yi-chun, SHEN De-zhen. Photoluminescence of (ZnCdTe,ZnSeTe)/ZnTe Quantum Wells Grown by LP-MOCVD[J]. Chinese Journal of Luminescence, 2003,24(4): 371-374
王晓华, 单崇新, 张振中, 张吉英, 范希武, 吕有明, 刘益春, 申德振. LP-MOCVD生长(ZnCdTe,ZnSeTe)/ZnTe复合量子阱的激子发光研究[J]. 发光学报, 2003,24(4): 371-374 DOI:
WANG Xiao-hua, SHAN Chong-xin, ZHANG Zhen-zhong, ZHANG Ji-ying, FAN X W, LÜ You-ming, LIU Yi-chun, SHEN De-zhen. Photoluminescence of (ZnCdTe,ZnSeTe)/ZnTe Quantum Wells Grown by LP-MOCVD[J]. Chinese Journal of Luminescence, 2003,24(4): 371-374 DOI:
用低压金属有机化学气相沉积(LPMOCVD)的方法在GaAs(100)衬底上生长了(ZnCdTe
ZnSeTe)/ZnTe复合量子阱结构。测量了生长样品的光致发光(PL)谱
得到两个发光峰(记为
I
1
I
2
)
分析认为高能侧的峰为Zn
0.9
Cd
0.1
Te浅阱峰
而低能侧的峰为ZnSe
0.2
Te
0.8
深阱层的发射。对样品进行了变激发强度的PL谱测量
当激发强度增加时
PL谱中两个发光峰的比值(
I
2
/
I
1
)开始时迅速增加
然后缓慢减小。这是由于浅阱中的电子和空穴隧穿入深阱中导致空间电荷的分离
从而在复合量子阱结构中产生了一个内建电场所引起的。
In recent years
a successful effort has been made to grown Ⅱ-Ⅵ compound semiconductor because of their potential applications in visible light emitting devices in blue green region. ZnSe
1-
x
Te
x
with a range of
x
value
can be either n-type or p-type
was selected as quantum well material. We prepared a (ZnCdTe
ZnSeTe)/ZnTe complex quantum wells structure grown by LP MOCVD on GaAs (100) substrate. The photoluminescence (PL) spectra showed that there were two emission peaks at 2.201 and 2.128eV(labeled
I
1
and
I
2
respectively)
which was assigned to the emission of Zn
0.9
Cd
0.1
Te and ZnSe
0.2
Te
0.8
well layer
respectively. With the increasing of the excitation intensity
the PL intensity ratio of
I
2
/
I
1
grew significantly firstly
and then decreased slightly. This phenomenon was interpreted in terms of the formation of the build in electric field caused by the different tunneling rates of electrons and holes through the barrier in the structure.
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