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1. 南昌大学电气与自动化工程学院,江西 南昌,330047
2. 南昌大学材料科学工程系,江西 南昌,330047
3. 南昌大学电气与自动化工程学院,江西 南昌,330029
收稿日期:2001-09-18,
修回日期:2002-03-22,
纸质出版日期:2002-05-20
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元美玲, 刘南生, 王水凤, 曾宇昕, 汪庆年. 稀土Nd,Ce掺杂硅基薄膜光致发光特性[J]. 发光学报, 2002,23(3): 291-295
YUAN Mei-ling, LIU Nan-sheng, WANG Shui-feng, ZENG Yu-xin, WANG Qing-nian. Photoluminescence Properties in Nd, Ce-implanted Si-based Films[J]. Chinese Journal of Luminescence, 2002,23(3): 291-295
测量了Nd
Ce稀土离子注入Si基晶片
在不同离子注入剂量、不同退火条件下的室温光致发光(PL)谱
结果表明它们均具有蓝、紫发光峰
且发光稳定。在一定范围内发光效率随掺杂浓度的增加而增大
随退火条件的不同而改变。运用原子力显微镜(AFM)对样品的表面形貌进行了观察
结果显示
样品表面颗粒大小、粗糙度将影响其发光效率。表面颗粒大小均匀
均方根粗糙度小的样品发光效率较高。通过对样品的卢瑟福背散射(RBS)能谱测量
对样品的表面结构进行了探讨
并讨论了表面结构与光致发光特性之间的联系。对样品的发光机理作了初步探讨。
Silicon was a main material of micro-electronic devices.It was possessed of better advantage than other semiconductor materials.But semiconductor silicon was not regarded as one of candidates in optoelectronic materials because of its indirect bandgap and lower light efficiency.Thus its application in the luminescence material was restricted.For obtaining strong visible luminescence material
people have done more investigation.Recently the studies on the strong visible light emission at room temperature for the silicon based materials
such as porous Si
amorphous Si
RE-doped Sietc.
have brought about a public extensive attention in the silicon photo electronic integration.Some of rare-earth ions are the better light emitting ions
the method that rare-earth ion was doped into silicon by using ion-implantation was adopted by more and more people.The ion-implanted Si-based emitting materials are investigated for their light emission properties.Now
study of the light emission properties for silicon doped by RE is mainly limited to discussion of those for silicon doped by Er.Very few studies have been reported on luminescence properties for other RE doped silicon
many of them will be investigated in a deep going way.In this paper
rare earth ions Nd
Ce are implanted into monocrystal Si wafer and thermal oxide Si samples at the energy 45keV and with the doses of 1×10
17
5×10
17
and 1×10
18
cm
-2
separately using metal vapor vacuum arc (MEVVA) ion implantation.After rapid annealing treatment to the above implanted samples at 900℃
1000℃ and 1100℃
the photoluminescence (PL) spectra excited by ultraviolet are measured by Hitachi F
3
010 photoluminescence spectrophotometer at room temperature.The results show that all the samples possess blue-violet photoluminescence properties under the ultraviolet light excitation and its light emission is stable.The photoluminescence efficiency for the samples varies with the anneal condition
and the light emission is more intense when the doped impurity concentration is greater within a certain limits.The feature and appearance of the samples was surveyed by use of atomic force microscopy (AFM).The experimental results show that the surface grain size and coarse degree for sample have influence on its light emission efficiency.The light emission efficiency is higher when the surface grain size is symmetrical and average coarse degree is little for samples.Besides
the Rutherford Backscattering Spectrum (RBS) at room temperature for the samples annealed under O
2
at different temperature was measured.The photoluminescence mechanism for our sample is also discussed.
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