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1. 中国科学院长春光学精密机械与物理研究所, 吉林, 长春, 130022
2. 中国科学院长春光学精密机械与物理研究所激发态物理重点实验室, 吉林, 长春, 130022
3. 大阪工业大学新材料研究中心, 大阪旭区大宫, 535-8585, 日本
收稿日期:2002-07-20,
修回日期:2002-09-20,
纸质出版日期:2002-11-20
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李树玮, 缪国庆, 蒋红, 元光, 宋航, 金亿鑫, 小池一步, 矢野满明. MBE生长的垂直堆垛InAs量子点及HFET存储器件的应用[J]. 发光学报, 2002,23(6): 554-558
LI Shu-wei, MIAO Guo-qing, JIANG Hong, YUAN Guang, SONG Hang, JIN Yi-xin, Kazuto K, Mitsuaki Y. Vertically Stacked, Self-assembled MBE-grown InAs Quantum Dots and Application of Field Effect Transistor[J]. Chinese Journal of Luminescence, 2002,23(6): 554-558
李树玮, 缪国庆, 蒋红, 元光, 宋航, 金亿鑫, 小池一步, 矢野满明. MBE生长的垂直堆垛InAs量子点及HFET存储器件的应用[J]. 发光学报, 2002,23(6): 554-558 DOI:
LI Shu-wei, MIAO Guo-qing, JIANG Hong, YUAN Guang, SONG Hang, JIN Yi-xin, Kazuto K, Mitsuaki Y. Vertically Stacked, Self-assembled MBE-grown InAs Quantum Dots and Application of Field Effect Transistor[J]. Chinese Journal of Luminescence, 2002,23(6): 554-558 DOI:
用MBE设备以Stranski-Krastanov生长方式外延生长了5个周期垂直堆垛的InAs量子点
在生长过程中通过对量子点形状、尺寸的控制来提高垂直堆垛InAs量子点质量和均匀性。用原子力显微镜(AFM)进行表面形貌的表征
并利用光致发光(PL)和深能级瞬态谱(DLTS)对InAs量子点进行观测。所用Al
0.5
Ga
0.5
As势垒外延层
对镶嵌在其中的InAs量子点有很强的量子限制作用
并产生强量子限制效应
可以把InAs量子点的电子和空穴能级的热激发当作"深能级"的热激发来研究
这样可用DLTS方法进行测量。在垂直堆垛的InAs量子点的HFET器件中
由充电和放电过程的
I
DS
-
V
GS
曲线可以看到阈值电压有非常大的移动
这样便产生存储效应。
The epilayer of vertically stacked
self-assembled InAs Quantum Dots (QDs) was grown by MBE with solid sources in non-cracking K-cells
and the sample was fabricated to a FET structure using a conventional technology. A quantum dot (QD)
the behavior of which is to capture and emit carriers like a giant trap
is studied using deep level transient spectroscopy (DLTS) technique. The electrons and holes in the QDs are respectively emitted from the relevant energy levels to the conduction and valence bands of the barrier layer with increasing measurement temperature
and the thermal emission energies from the QDs are related to their discrete energy levels. The 5-period vertically stacked InAs QDs in the barrier layer of a field-effect type structure were measured
and the results were found to correspond to the capacitance-voltage and photoluminescence properties. At 77K and room temperature
the threshold voltage shift values are 0.75V and 0.35V
which are caused by the trapping and detrapping of electrons in the quantum dots. Discharging and charging curves form a part of a hysteresis loop exhibiting a memory function. The electrical injection of confined electrons in QDs products the threshold voltage shift and memory function with the persistent electron trapping
which shows the potential use for a room temperature application.
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