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兰州大学物理学院, 甘肃, 兰州, 730000
收稿日期:2001-03-13,
修回日期:2001-06-28,
纸质出版日期:2001-11-30
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郑代顺, 李海蓉, 王延勇, 张福甲. Alq<sub>3</sub>/ITO结构的表面和界面电子状态的XPS研究[J]. 发光学报, 2001,22(4): 351-356
ZHENG Dai-shun, LI Hai-rong, WANG Yan-yong, ZHANG Fu-jia. XPS Investigation of Surface and Interface Electronic States of Alq<sub>3</sub>/ITO[J]. Chinese Journal of Luminescence, 2001,22(4): 351-356
用传统的真空蒸镀法制备了Alq
3
/ITO样品
并用X光电子能谱(XPS)研究了Alq
3
/ITO紧密接触的表面和界面电子化学状态.对Alq
3
/ITO样品的表面分析表明
在Alq
3
分子中
Al原子的束缚能(E
b
)为70.7eV和75.1eV.分别对应于Al(0)和Al(Ⅲ)态
C原子的束缚能为285.8eV、286.3eV和286.8eV
分别对应于C-C、C-O和C-N键;N原子的主峰位于401.0eV
对应于C-N=C键;而O原子主要与H原子成键
其束缚能为532.8eV.为了研究Alq
3
/ITO的界面电子状态
我们用氩离子束对样品表面进行了溅射剥蚀
当溅射时间分别为30
35
45分钟时进行XPS采谱分析.结果表明
随着氩离子束溅射时间增长
Al2p、C1s、N1s、O1s、In3d
5/2
和Sn3d
5/2
峰都向低束缚能方向有微小移动
且Al2p、C1s和N1s峰变弱
这是受ITO中扩散进入Alq
3
层的O、In和Sn原子的影响所致.
An understanding of the surface and interface states of the organic material and the underlying anode material is meaningful for organic light-emitting devices(OLEDs).The tris-(8-hydroxyquinoline) aluminum(Alq
3
)/indium-tin oxide(ITO) samples were fabricated with traditional vacuum deposition.The surface and interface electronic chemical states of the Alq
3
and the underlying ITO have been investigated by X-ray photoelectron spectroscopy(XPS).The analysis on XPS spectra of the surface of the Alq
3
/ITO structure shows that
in Alq
3
molecule
the binding energy(
E
b
) of Al atoms is 70.7eV and 75.1eV
corresponding to Al(0) and Al(Ⅲ)
respectively.The binding energy of C atoms is 285.8eV
286.3eV and 286.8eV
corresponding to C atoms of C-C groups
C-O and C-N bonds
respectively.The N1s main peak locates at 401.0eV
corresponding to N atoms of C-N=C bonds.O atoms mainly bond to H atoms
and the bonding energy is 532.8eV.The N and O atoms also interact with Al atoms through coordination bonds.In order to investigate the interface electronic states of the Alq
3
/ITO structure
the samples are sputtered by argon ions beam.The analysis on XPS spectra of the interface of the Alq
3
/ITO structure indicates that
as the sputtering time of argon ions beam increasing
Al2p
C1s and N1s peaks get weaker
which indicates the Alq
3
film becomes thinner and thinner and the concentrations of the Al
C and N atoms reduce with increasing sputtering time.The core-levels of Al2p
C1s
N1s
O1s
In3d
5/2
and Sn3d
5/2
spectra slightly shift towards lower binding energy when the sputtering time increasing
this may be caused by the effect of oxygen
indium and tin in ITO diffusing into Alq
3
layer and the argon ions beam with high energy.Besides these
with the sputtering time of argon ions beam increasing
the relative concentration of O atoms from ITO diffusing into Alq
3
increases
and the interaction of O atoms with In and Sn atoms gradually reduces
which results in the In
2
O
3
and SnO
2
turning into suboxides or metal states In and Sn
so that the binding energy of In and Sn atoms decreases.
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