Polarity-controlled Growth of GaN by MOVPE and RF-MBE
发光学报2001年22卷第4期 页码:324-328
作者机构:
1. Center for Frontier Electronics and Photonics, Chiba, University VBL
2. Department of Electronics and Mechanical Engineering, Chiba University 1-33, Yayoi-cho, Inage-, Chiba ku,Japan
3. Department of Media Science, Teikyo University of Science and Technology,Japan
作者简介:
基金信息:
DOI:
中图分类号:TN312.8
收稿日期:2001-07-20,
修回日期:2001-03-17,
纸质出版日期:2001-11-30
稿件说明:
移动端阅览
Yoshikawa A, Xu K, Jia A W, Takahashi K . 用MOVPE和RF-MBE方法极性控制生长GaN[J]. 发光学报, 2001,22(4): 324-328
Yoshikawa A, Xu K, Jia A W, Takahashi K. Polarity-controlled Growth of GaN by MOVPE and RF-MBE[J]. Chinese Journal of Luminescence, 2001,22(4): 324-328
Yoshikawa A, Xu K, Jia A W, Takahashi K . 用MOVPE和RF-MBE方法极性控制生长GaN[J]. 发光学报, 2001,22(4): 324-328DOI:
Yoshikawa A, Xu K, Jia A W, Takahashi K. Polarity-controlled Growth of GaN by MOVPE and RF-MBE[J]. Chinese Journal of Luminescence, 2001,22(4): 324-328DOI:
the polarity-controlled growth of GaN on sapphire substrate by LP-MOVPE and RF-MBE is demonstrated.The mechanisms for polarity selection of GaN on sapphire substrate both in MOVPE and MBE growth are discussed based on the "two monolayers of Al" model
which also gives a reasonable explanation to the polarity reversion mechanism by AlN.Through the polarity-controlled growth
surface morphology and electrical property of GaN grown by RF-MBE is improved;a three-step growth method is developed for LP-MOVPE
so that high quality GaN films can be obtained in a more epitaxial way on sapphire substrate.