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南昌大学, 物理系, 江西, 南昌, 330047
收稿日期:2004-08-16,
修回日期:2004-12-13,
纸质出版日期:2006-01-20
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王水凤, 姜乐, 戴丽丽, 元美玲, 唐小迅. 多孔硅的后处理及其发光特性[J]. 发光学报, 2006,27(1): 118-122
WANG Shui-feng, JIANG Le, DAI Li-li, YUAN Mei-ling, TANG Xiao-xun. Photoluminescence Properties of Porous Silicon after Acid Treatment and Cathodic Reduction Process[J]. Chinese Journal of Luminescence, 2006,27(1): 118-122
王水凤, 姜乐, 戴丽丽, 元美玲, 唐小迅. 多孔硅的后处理及其发光特性[J]. 发光学报, 2006,27(1): 118-122 DOI:
WANG Shui-feng, JIANG Le, DAI Li-li, YUAN Mei-ling, TANG Xiao-xun. Photoluminescence Properties of Porous Silicon after Acid Treatment and Cathodic Reduction Process[J]. Chinese Journal of Luminescence, 2006,27(1): 118-122 DOI:
采用一种新颖而简便的方法
改善多孔硅的发光特性。该方法包括酸处理和阴极还原两步。实验证明通过对多孔硅进行酸处理
能有效提高多孔硅的发光强度;通过对多孔硅进行阴极还原处理
能明显改善多孔硅的发光稳定性
而且发光强度也得到了提高。综合酸处理和阴极还原两技术的特点
对所制备的多孔硅立即先进行酸处理
然后再对其进行阴极还原处理
结果表明该方法能较好地提高多孔硅的发光效率和发光稳定性。而且还对其发光机制进行了探讨。
Silicon is a traditional semiconduction material
as we all know
and has a broad use in semiconduction industry. But because of its indirect bandgap and rather low light effiency
silicon had not been treated in application in optoelectronic material making process. In 1990
Canham published that porous silicon sample fabricated by electrochemical anodization etch possesses has very intense photoluminescence(PL)emission
and its light efficiency can campare to direct bandgap material GaAs. This report gave a new means to realize Si-based emitting material of photoelectricity integration.The investigation on photoluminescence properties of porous silicon samples made through conventional electrochemical anodization method under different conditions was reported. Two different ways have been used to treat porous silicon samples
including cathodic reduction process and acid treatment. Moreover
we mainly focus on contrast of photoluminescence properties of treated porous silicon samples by two different ways
comparing and analyzing the photoluminescence spectra of different samples. Experimental results indicate that through nitric acid treatment
an increase in luminous intensity of porous silicon can been seen
and the effect is related to nitric acid concentration. The photoluminescence will be enhanced with the nitric acid concentration increasing. Compared with other acids
nitric acid treatment can effectively increase the luminescence intensity of porous silicon and make the luminescence stability of porous silicon better. The results also prove that the process of cathodic reduction can obviously improve luminescence stability of porous silicon and luminescence intensity as well. In this experiment
we found that aging time play a comparative important role in final experimental result. The results showed that the two methods can effectively enhance luminescence efficiency and stability. Moreover
we firstly processed cathodic reduction
then nitric acid treatment
giving a comparsion between the effect of these two methods. A conclusion can be drawn that the method of firstly processed porous silicon samples with nitric acid treatment and secondly cathodic reduction treatment has better effect to porous silicon luminescence intensity and stability than that of firstly cathodic reduction treatment and secondly nitric acid treatment. In addition
we further discussed the possible luminescence model of porous silicon.
Canham L T.Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafters[J].Appl.Phys.Lett.,1990,57:1046-1048.
Wang Xiaojing,Wang Zuochen,Li Qingshan,et al.Effect of preparation conditions on photoluminescence of porous silicon[J].Chin.J.Lumin.(发光学报),2004,25(3):261-266 (in Chinese).
Wang Xiaojing,Li Qingshan.Photoluminescence mechanism of porous silicon[J].Chin.J.Lumin.(发光学报),2004,25(4):396-400 (in Chinese).
Chen Songyan,Cai Beini,Huang Yanhua,et al.New anodic oxidized technology of porous silicon[J].Chin.J.Lumin.(发光学报),2004,25(5):561-566 (in Chinese).
Li Hongjian,Peng Jingcui,Xu Xuemei,et al.Photolumimescence property of passivated porous silicon[J].Chin.J.Semicon.(半导体学报),2002,23(1):34-37 (in Chinese).
Yu Xianwen,Zhu Rongjin,Zhu Ziqiang,et al.Drying methods of porous silicon[J].Chin.J.Semicond.(半导体学报),2003,24(6):663-666 (in Chinese).
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