YANG Zhi-jian, HU Xiao-dong, ZHANG Bei, LU Min, LU Yu, PAN Yao-bo, ZHANG Zhen-sheng, REN Qian, XU Jun, LI Zhong-hui, CHEN Zhi-zhong, QIN Zhi-xin, YU Tong-jun, TONG Yu-zhen, ZHANG Guo-yi. High Quality GaN Grown by Epitaxial Lateral Overgrowth Technique and Epitaxial Defects Observation[J]. Chinese Journal of Luminescence, 2005,26(1): 72-76
YANG Zhi-jian, HU Xiao-dong, ZHANG Bei, LU Min, LU Yu, PAN Yao-bo, ZHANG Zhen-sheng, REN Qian, XU Jun, LI Zhong-hui, CHEN Zhi-zhong, QIN Zhi-xin, YU Tong-jun, TONG Yu-zhen, ZHANG Guo-yi. High Quality GaN Grown by Epitaxial Lateral Overgrowth Technique and Epitaxial Defects Observation[J]. Chinese Journal of Luminescence, 2005,26(1): 72-76DOI:
High quality GaN is grown by epitaxial lateral overgrowth(ELO) technique on SiO
2
-patterned GaN “template”.he results from luminescence microscope observation reveal that nucleation happens on the SiO
2
mask. After the thickness reaches about 4.5 μm
the coalescence starts. The lateral growth rate is almost the same as the vertical growth rate. Voids are formed on all of the SiO
2
mask area. ELO GaN is etched in molten KOH for 13min at 240℃. The threading dislocation density is reduced to almost zero in the area on mask. And the threading dislocation density is still high in the area on windows. It is the order of 10
8
cm
-2
. Also we found that the qualities in masks area for samples with different window area size are similar and have no relation with window area size. The room temperature photoluminescence PL results indicate that the stress in ELO GaN has been released partially.